Saved in:
Bibliographic Details
Main Author: Koby, Davis
Format: Recurso digital
Language:
Published: Zenodo 2026
Subjects:
Online Access:https://doi.org/10.5281/zenodo.20249669
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1866901961255682048
author Koby, Davis
author_facet Koby, Davis
contents <p>The synergistic integration of holography and lithography represents a paradigm shift in</p> <p>volumetric nanomanufacturing, enabling the precise fabrication of complex three-dimensional</p> <p>nanostructures at scale. This paper synthesizes the foundational principles of optical holog-</p> <p>raphy with advanced lithographic techniques, emphasizing the pivotal role of harmonic</p> <p>physics—particularly Fourier optics and wave interference decomposition—in achieving sub-</p> <p>10 nm resolution and true volumetric control. We explore computer-generated holograms</p> <p>(CGHs), multi-beam interference lithography, and their convergence with two-photon poly-</p> <p>merization and stimulated emission depletion (STED) microscopy-inspired methods. Cross-</p> <p>disciplinary innovations in metamaterials, quantum photonics, and biomedical scaffolds are</p> <p>examined, supported by recent experimental advances (2023–2026). Challenges including</p> <p>material nonlinearity, computational overhead, and scalability are addressed, culminating in</p> <p>a forward-looking roadmap for atomic-precision manufacturing and hybrid opto-electronic</p> <p>systems. This synthesis underscores the transformative potential of harmonic wave engi-</p> <p>neering in next-generation nanofabrication.</p>
format Recurso digital
id zenodo_https___doi_org_10_5281_zenodo_20249669
institution Zenodo
language
publishDate 2026
publisher Zenodo
record_format zenodo
spellingShingle Next Generation Lithographic Nanofabrication Achieving sub- 10 nm resolution and true volumetric control. Computer-generated holograms (CGHs), multi-beam interference lithography, and their convergence with two-photon poly- merization and stimulated emission depletion (STED) microscopy-inspired methods. Cross- disciplinary innovations in metamaterials, quantum photonics, and biomedical scaffolds are a forward-looking roadmap for atomic-precision manufacturing next-generation nanofabrication.
Koby, Davis
Holography
Holography/education
Holography/standards
Holography/trends
<p>The synergistic integration of holography and lithography represents a paradigm shift in</p> <p>volumetric nanomanufacturing, enabling the precise fabrication of complex three-dimensional</p> <p>nanostructures at scale. This paper synthesizes the foundational principles of optical holog-</p> <p>raphy with advanced lithographic techniques, emphasizing the pivotal role of harmonic</p> <p>physics—particularly Fourier optics and wave interference decomposition—in achieving sub-</p> <p>10 nm resolution and true volumetric control. We explore computer-generated holograms</p> <p>(CGHs), multi-beam interference lithography, and their convergence with two-photon poly-</p> <p>merization and stimulated emission depletion (STED) microscopy-inspired methods. Cross-</p> <p>disciplinary innovations in metamaterials, quantum photonics, and biomedical scaffolds are</p> <p>examined, supported by recent experimental advances (2023–2026). Challenges including</p> <p>material nonlinearity, computational overhead, and scalability are addressed, culminating in</p> <p>a forward-looking roadmap for atomic-precision manufacturing and hybrid opto-electronic</p> <p>systems. This synthesis underscores the transformative potential of harmonic wave engi-</p> <p>neering in next-generation nanofabrication.</p>
title Next Generation Lithographic Nanofabrication Achieving sub- 10 nm resolution and true volumetric control. Computer-generated holograms (CGHs), multi-beam interference lithography, and their convergence with two-photon poly- merization and stimulated emission depletion (STED) microscopy-inspired methods. Cross- disciplinary innovations in metamaterials, quantum photonics, and biomedical scaffolds are a forward-looking roadmap for atomic-precision manufacturing next-generation nanofabrication.
topic Holography
Holography/education
Holography/standards
Holography/trends
url https://doi.org/10.5281/zenodo.20249669