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| Format: | Recurso digital |
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Zenodo
2026
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| Online Access: | https://doi.org/10.5281/zenodo.20249669 |
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Table of Contents:
- <p>The synergistic integration of holography and lithography represents a paradigm shift in</p> <p>volumetric nanomanufacturing, enabling the precise fabrication of complex three-dimensional</p> <p>nanostructures at scale. This paper synthesizes the foundational principles of optical holog-</p> <p>raphy with advanced lithographic techniques, emphasizing the pivotal role of harmonic</p> <p>physics—particularly Fourier optics and wave interference decomposition—in achieving sub-</p> <p>10 nm resolution and true volumetric control. We explore computer-generated holograms</p> <p>(CGHs), multi-beam interference lithography, and their convergence with two-photon poly-</p> <p>merization and stimulated emission depletion (STED) microscopy-inspired methods. Cross-</p> <p>disciplinary innovations in metamaterials, quantum photonics, and biomedical scaffolds are</p> <p>examined, supported by recent experimental advances (2023–2026). Challenges including</p> <p>material nonlinearity, computational overhead, and scalability are addressed, culminating in</p> <p>a forward-looking roadmap for atomic-precision manufacturing and hybrid opto-electronic</p> <p>systems. This synthesis underscores the transformative potential of harmonic wave engi-</p> <p>neering in next-generation nanofabrication.</p>