Lignende værker

• Atomic layer etching of niobium nitride using sequential exposures of O$_2$ and H$_2$/SF$_6$ plasmas
  af: Hossain, Azmain A., et al.
  Udgivet: (2025)
• Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H$_2$ and SF$_6$ plasmas
  af: Chen, Ivy I., et al.
  Udgivet: (2023)
• Atomic layer etching of SiO$_2$ using sequential exposures of Al(CH$_3$)$_3$ and H$_2$/SF$_6$ plasma
  af: Catherall, David, et al.
  Udgivet: (2024)
• Investigation of Real-Space Transfer Noise in InP Quantum Wells
  af: Zhang, Jiayin, et al.
  Udgivet: (2025)
• Atomic layer etching of SiO$_2$ using sequential SF$_6$ gas and Ar plasma
  af: Peng, Jun, et al.
  Udgivet: (2024)