Derrien, T. J. -., Krüger, J., Itina, T. E., Höhm, S., Rosenfeld, A., & Bonse, J. (2013). Rippled area formed by surface plasmon polaritons upon femtosecond laser double-pulse irradiation of silicon: The role of carrier generation and relaxation processes.
Citazione stile Chigago Style (17a edizione)Derrien, Thibault J. -Y., Jörg Krüger, Tatiana E. Itina, Sandra Höhm, Arkadi Rosenfeld, e Jörn Bonse. Rippled Area Formed by Surface Plasmon Polaritons upon Femtosecond Laser Double-pulse Irradiation of Silicon: The Role of Carrier Generation and Relaxation Processes. 2013.
Citatione MLA (9a ed.)Derrien, Thibault J. -Y., et al. Rippled Area Formed by Surface Plasmon Polaritons upon Femtosecond Laser Double-pulse Irradiation of Silicon: The Role of Carrier Generation and Relaxation Processes. 2013.