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Planar and 3-dimensional damage free etching of $β$-Ga2O3 using atomic gallium flux

Fuente: arXiv
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Bibliographic Details
Main Authors: Kalarickal, Nidhin Kurian, Fiedler, Andreas, Dhara, Sushovan, Rahman, Mohammad Wahidur, Kim, Taeyoung, Xia, Zhanbo, Eddine, Zane Jamal, Dheenan, Ashok, Brenner, Mark, Rajan, Siddharth
Format: Preprint
Published: 2021
Subjects:
Materials Science
Applied Physics
Online Access:
Acceder al recurso
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