TCAD Modeling of Cryogenic nMOSFET ON-State Current and Subthreshold Slope

Fuente: arXiv
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Main Authors: Dhillon, Prabjot, Dao, Nguyen Cong, Wong, Hiu Yung
Format: Preprint
Published: 2021
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author Dhillon, Prabjot
Dao, Nguyen Cong
Dao, Nguyen Cong
Wong, Hiu Yung
author_facet Dhillon, Prabjot
Dao, Nguyen Cong
Dao, Nguyen Cong
Wong, Hiu Yung
contents In this paper, through careful calibration, we demonstrate the possibility of using a single set of models and parameters to model the ON current and Sub-threshold Slope (SS) of an nMOSFET at 300K and 5K using Technology Computer-Aided Design (TCAD). The device used is a 0.35um technology nMOSFET with W/L=10um/10um. We show that it is possible to model the abnormal SS by using interface acceptor traps with a density less than 2e12cm-2. We also propose trap distribution profiles in the energy space that can be used to reproduce other observed SS from 4K to 300K. Although this work does not prove or disprove any possible origin of the abnormal SS, it shows that one cannot completely rule out the interfacial traps as the origin and it shows that interfacial traps can be used to model the abnormal SS before the origin is fully understood. We also show that Drain-Induced-Barrier-Lowering (DIBL) is much reduced at cryogenic temperature due to the abnormal slope and the device optimization strategy might need to be revised.
format Preprint
id arxiv_https___arxiv_org_abs_2107_07139
institution arXiv
publishDate 2021
record_format arxiv
spellingShingle TCAD Modeling of Cryogenic nMOSFET ON-State Current and Subthreshold Slope
Dhillon, Prabjot
Dao, Nguyen Cong
Dao, Nguyen Cong
Wong, Hiu Yung
Computational Physics
Applied Physics
In this paper, through careful calibration, we demonstrate the possibility of using a single set of models and parameters to model the ON current and Sub-threshold Slope (SS) of an nMOSFET at 300K and 5K using Technology Computer-Aided Design (TCAD). The device used is a 0.35um technology nMOSFET with W/L=10um/10um. We show that it is possible to model the abnormal SS by using interface acceptor traps with a density less than 2e12cm-2. We also propose trap distribution profiles in the energy space that can be used to reproduce other observed SS from 4K to 300K. Although this work does not prove or disprove any possible origin of the abnormal SS, it shows that one cannot completely rule out the interfacial traps as the origin and it shows that interfacial traps can be used to model the abnormal SS before the origin is fully understood. We also show that Drain-Induced-Barrier-Lowering (DIBL) is much reduced at cryogenic temperature due to the abnormal slope and the device optimization strategy might need to be revised.
title TCAD Modeling of Cryogenic nMOSFET ON-State Current and Subthreshold Slope
topic Computational Physics
Applied Physics
url https://arxiv.org/abs/2107.07139