Effect of Buffer Termination on Intermixing and Conductivity in LaTiO$_3$/SrTiO$_3$ Heterostructures Integrated on Si(100)

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Main Authors: Chen, Tongjie, Ahmadi-Majlan, Kamyar, Lim, Zheng Hui, Zhang, Zhan, Ngai, Joseph H., Kumah, Divine . P.
Format: Preprint
Published: 2021
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author Chen, Tongjie
Ahmadi-Majlan, Kamyar
Lim, Zheng Hui
Zhang, Zhan
Ngai, Joseph H.
Kumah, Divine . P.
author_facet Chen, Tongjie
Ahmadi-Majlan, Kamyar
Lim, Zheng Hui
Zhang, Zhan
Ngai, Joseph H.
Kumah, Divine . P.
contents The control of chemical exchange across heterointerfaces formed between ultra-thin functional transition-metal oxide layers provides an effective route to manipulate the electronic properties of these systems. We show that cationic exchange across the interface between the Mott insulator, LaTiO$_3$(LTO) grown epitaxially on SrTiO$_3$(STO)-buffered Silicon by molecular beam epitaxy depends strongly on the surface termination of the strained STO buffer. Using a combination of temperature-dependent transport and synchrotron X-ray crystal truncation rods and reciprocal space mapping, an enhanced conductivity in STO/LTO/SrO- terminated STO buffers compared to heterostructures with TiO$_2$-terminated STO buffers is correlated with La/Sr exchange and the formation of metallic La$_{1-x}$Sr$_x$TiO$_3$. La/Sr exchange effectively reduces the strain energy of the system due to the large lattice mismatch between the nominal oxide layers and the Si substrate.
format Preprint
id arxiv_https___arxiv_org_abs_2109_08586
institution arXiv
publishDate 2021
record_format arxiv
spellingShingle Effect of Buffer Termination on Intermixing and Conductivity in LaTiO$_3$/SrTiO$_3$ Heterostructures Integrated on Si(100)
Chen, Tongjie
Ahmadi-Majlan, Kamyar
Lim, Zheng Hui
Zhang, Zhan
Ngai, Joseph H.
Kumah, Divine . P.
Materials Science
The control of chemical exchange across heterointerfaces formed between ultra-thin functional transition-metal oxide layers provides an effective route to manipulate the electronic properties of these systems. We show that cationic exchange across the interface between the Mott insulator, LaTiO$_3$(LTO) grown epitaxially on SrTiO$_3$(STO)-buffered Silicon by molecular beam epitaxy depends strongly on the surface termination of the strained STO buffer. Using a combination of temperature-dependent transport and synchrotron X-ray crystal truncation rods and reciprocal space mapping, an enhanced conductivity in STO/LTO/SrO- terminated STO buffers compared to heterostructures with TiO$_2$-terminated STO buffers is correlated with La/Sr exchange and the formation of metallic La$_{1-x}$Sr$_x$TiO$_3$. La/Sr exchange effectively reduces the strain energy of the system due to the large lattice mismatch between the nominal oxide layers and the Si substrate.
title Effect of Buffer Termination on Intermixing and Conductivity in LaTiO$_3$/SrTiO$_3$ Heterostructures Integrated on Si(100)
topic Materials Science
url https://arxiv.org/abs/2109.08586