Self-Sputtering of the Lennard-Jones Crystal
Fuente:
arXiv
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| Autores principales: | , , , |
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| Formato: | Preprint |
| Publicado: |
2022
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| Acceso en línea: | |
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| _version_ | 1866910492412346368 |
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| author | Mauchamp, Nicolas A. Ikuse, Kazumasa Isobe, Michiro Hamaguchi, Satoshi |
| author_facet | Mauchamp, Nicolas A. Ikuse, Kazumasa Isobe, Michiro Hamaguchi, Satoshi |
| contents | The self-sputtering yield of the (100) face-centered cubic (fcc) crystal surface consisting of particles interacting with the Lennard-Jones (LJ) potential is presented as a function of the normalized incident particle kinetic energy for normal incidence. Because the self-sputtering yield depends only on the normalized incident energy, the yield curve presented here is the universal curve, independent of the Lennard-Jones parameters, and therefore serves as the fundamental reference data for the LJ system. The self-sputtering yield data are also compared with experimentally obtained self-sputtering yields of some metals, which shows reasonable agreement at relatively low ion incident energy where mostly deposition occurs. At higher ion energy, the self-sputtering of such an LJ material does not represent those of real solids. This is because the repulsive interactions of the LJ potential do not represent those of actual atoms at short distances. The angle dependence of the self-sputtering yield is also presented for some selected normalized energies. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2201_09660 |
| institution | arXiv |
| publishDate | 2022 |
| record_format | arxiv |
| spellingShingle | Self-Sputtering of the Lennard-Jones Crystal Mauchamp, Nicolas A. Ikuse, Kazumasa Isobe, Michiro Hamaguchi, Satoshi Materials Science Plasma Physics The self-sputtering yield of the (100) face-centered cubic (fcc) crystal surface consisting of particles interacting with the Lennard-Jones (LJ) potential is presented as a function of the normalized incident particle kinetic energy for normal incidence. Because the self-sputtering yield depends only on the normalized incident energy, the yield curve presented here is the universal curve, independent of the Lennard-Jones parameters, and therefore serves as the fundamental reference data for the LJ system. The self-sputtering yield data are also compared with experimentally obtained self-sputtering yields of some metals, which shows reasonable agreement at relatively low ion incident energy where mostly deposition occurs. At higher ion energy, the self-sputtering of such an LJ material does not represent those of real solids. This is because the repulsive interactions of the LJ potential do not represent those of actual atoms at short distances. The angle dependence of the self-sputtering yield is also presented for some selected normalized energies. |
| title | Self-Sputtering of the Lennard-Jones Crystal |
| topic | Materials Science Plasma Physics |
| url | https://arxiv.org/abs/2201.09660 |