Hafnia for analog memristor: Influence of stoichiometry and crystalline structure

Fuente: arXiv

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Bibliographic Details
Main Authors:	Li, Li-Heng, Xue, Kan-Hao, Yuan, Jun-Hui, Mao, Ge-Qi, Miao, Xiangshui
Format:	Preprint
Published:	2022
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2203.16131