High-Sensitivity Characterization of Ultra-Thin Atomic Layers using Spin-Hall Effect of Light

Fuente: arXiv
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Auteurs principaux: Panda, Janmey Jay, Sahoo, Krishna Rani, Praturi, Aparna, Lal, Ashique, Viswanathan, Nirmal K., Narayanan, Tharangattu N., Rajalakshmi, G.
Format: Preprint
Publié: 2022
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author Panda, Janmey Jay
Sahoo, Krishna Rani
Praturi, Aparna
Lal, Ashique
Viswanathan, Nirmal K.
Narayanan, Tharangattu N.
Rajalakshmi, G.
author_facet Panda, Janmey Jay
Sahoo, Krishna Rani
Praturi, Aparna
Lal, Ashique
Viswanathan, Nirmal K.
Narayanan, Tharangattu N.
Rajalakshmi, G.
contents Magnetic/non-magnetic/heterostructured ultra-thin films' characterisation is highly demanding due to the emerging diverse applications of such films. Diverse measurements are usually performed on such systems to infer their electrical, optical and magnetic properties. We demonstrate that MOKE-based spin-Hall effect of light (SHEL) is a versatile surface characterization tool for studying materials' magnetic and dielectric ordering. Using this technique, we measure magnetic field dependent complex Kerr angle and the coercivity in ultra-thin films of permalloy (Py) and at molybdenum disulphide (MoS$_2$) - permalloy (MSPy) hetero-structure interfaces. The measurements are compared with standard magneto-optic Kerr effect (MOKE) studies to demonstrate that SHEL-MOKE is a practical alternative to the conventional MOKE method, with competitive sensitivity. A comprehensive theoretical model and simulation data are provided to further strengthen the potential of this simple non-invasive optical method. The theoretical model is applied to extract the optical conductivity and susceptibility of non-magnetic ultra-thin layers such as MoS$_2$ .
format Preprint
id arxiv_https___arxiv_org_abs_2205_00660
institution arXiv
publishDate 2022
record_format arxiv
spellingShingle High-Sensitivity Characterization of Ultra-Thin Atomic Layers using Spin-Hall Effect of Light
Panda, Janmey Jay
Sahoo, Krishna Rani
Praturi, Aparna
Lal, Ashique
Viswanathan, Nirmal K.
Narayanan, Tharangattu N.
Rajalakshmi, G.
Optics
Materials Science
Applied Physics
Magnetic/non-magnetic/heterostructured ultra-thin films' characterisation is highly demanding due to the emerging diverse applications of such films. Diverse measurements are usually performed on such systems to infer their electrical, optical and magnetic properties. We demonstrate that MOKE-based spin-Hall effect of light (SHEL) is a versatile surface characterization tool for studying materials' magnetic and dielectric ordering. Using this technique, we measure magnetic field dependent complex Kerr angle and the coercivity in ultra-thin films of permalloy (Py) and at molybdenum disulphide (MoS$_2$) - permalloy (MSPy) hetero-structure interfaces. The measurements are compared with standard magneto-optic Kerr effect (MOKE) studies to demonstrate that SHEL-MOKE is a practical alternative to the conventional MOKE method, with competitive sensitivity. A comprehensive theoretical model and simulation data are provided to further strengthen the potential of this simple non-invasive optical method. The theoretical model is applied to extract the optical conductivity and susceptibility of non-magnetic ultra-thin layers such as MoS$_2$ .
title High-Sensitivity Characterization of Ultra-Thin Atomic Layers using Spin-Hall Effect of Light
topic Optics
Materials Science
Applied Physics
url https://arxiv.org/abs/2205.00660