Establishing Epitaxial Connectedness in Multi-Stacking: The Survival of Thru-Holes in Thru-Hole Epitaxy

Fuente: arXiv
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Autori principali: Lee, Youngjun, Lee, Seungjun, Choi, Jaewu, Kim, Chinkyo, Kwon, Young-Kyun
Natura: Preprint
Pubblicazione: 2022
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author Lee, Youngjun
Lee, Seungjun
Choi, Jaewu
Kim, Chinkyo
Kwon, Young-Kyun
author_facet Lee, Youngjun
Lee, Seungjun
Choi, Jaewu
Kim, Chinkyo
Kwon, Young-Kyun
contents Thru-hole epitaxy has recently been reported to be able to grow readily detachable domains crystallographically aligned with the underlying substrate over 2D mask material transferred onto a substrate. [Jang \textit{et al.}, \textit{Adv. Mater. Interfaces}, \textbf{2023} \textit{10}, 4 2201406] While the experimental demonstration of thru-hole epitaxy of GaN over multiple stacks of $h$-BN was evident, the detailed mechanism of how small holes in each stack of $h$-BN survived as thru-holes during multiple stacking of $h$-BN was not intuitively clear. Here, we use Monte Carlo simulations to investigate the conditions under which holes in each stack of 2D mask layers can survive as thru-holes during multiple stacking. If holes are highly anisotropic in shape by connecting smaller holes in a particular direction, thru-holes can be maintained with a high survival rate per stack, establishing more epitaxial connectedness. Our work verifies and supports that thru-hole epitaxy is attributed to the epitaxial connectedness established by thru-holes surviving even through multiple stacks.
format Preprint
id arxiv_https___arxiv_org_abs_2210_04753
institution arXiv
publishDate 2022
record_format arxiv
spellingShingle Establishing Epitaxial Connectedness in Multi-Stacking: The Survival of Thru-Holes in Thru-Hole Epitaxy
Lee, Youngjun
Lee, Seungjun
Choi, Jaewu
Kim, Chinkyo
Kwon, Young-Kyun
Materials Science
Applied Physics
Thru-hole epitaxy has recently been reported to be able to grow readily detachable domains crystallographically aligned with the underlying substrate over 2D mask material transferred onto a substrate. [Jang \textit{et al.}, \textit{Adv. Mater. Interfaces}, \textbf{2023} \textit{10}, 4 2201406] While the experimental demonstration of thru-hole epitaxy of GaN over multiple stacks of $h$-BN was evident, the detailed mechanism of how small holes in each stack of $h$-BN survived as thru-holes during multiple stacking of $h$-BN was not intuitively clear. Here, we use Monte Carlo simulations to investigate the conditions under which holes in each stack of 2D mask layers can survive as thru-holes during multiple stacking. If holes are highly anisotropic in shape by connecting smaller holes in a particular direction, thru-holes can be maintained with a high survival rate per stack, establishing more epitaxial connectedness. Our work verifies and supports that thru-hole epitaxy is attributed to the epitaxial connectedness established by thru-holes surviving even through multiple stacks.
title Establishing Epitaxial Connectedness in Multi-Stacking: The Survival of Thru-Holes in Thru-Hole Epitaxy
topic Materials Science
Applied Physics
url https://arxiv.org/abs/2210.04753