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Bibliographic Details
Main Authors: Alam, Md Tahmidul, Gupta, Chirag
Format: Preprint
Published: 2023
Subjects:
Online Access:https://arxiv.org/abs/2304.04648
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author Alam, Md Tahmidul
Gupta, Chirag
author_facet Alam, Md Tahmidul
Gupta, Chirag
contents A broad TCAD simulation analysis of a monolithic common drain bidirectional GaN HEMT was performed. We used gate-to-gate distances of 4 microns and 6 microns for the devices optimized with two field plates. The breakdown voltages were 675V and 915V respectively. Inclusion of field plates near both the gates produced electric field peaks at the opposite ends of the transistor simultaneously. This resulted in better electric field management or higher blocking voltage per unit length. Consequently, the 675V monolithic bidirectional HEMT had an impressive 40% improvement in on-resistance than its 650V typical series/parallel counterpart.
format Preprint
id arxiv_https___arxiv_org_abs_2304_04648
institution arXiv
publishDate 2023
record_format arxiv
spellingShingle Comprehensive TCAD Simulation Study of High Voltage (>650V) Common Drain Bidirectional AlGaN/GaN HEMTs
Alam, Md Tahmidul
Gupta, Chirag
Applied Physics
A broad TCAD simulation analysis of a monolithic common drain bidirectional GaN HEMT was performed. We used gate-to-gate distances of 4 microns and 6 microns for the devices optimized with two field plates. The breakdown voltages were 675V and 915V respectively. Inclusion of field plates near both the gates produced electric field peaks at the opposite ends of the transistor simultaneously. This resulted in better electric field management or higher blocking voltage per unit length. Consequently, the 675V monolithic bidirectional HEMT had an impressive 40% improvement in on-resistance than its 650V typical series/parallel counterpart.
title Comprehensive TCAD Simulation Study of High Voltage (>650V) Common Drain Bidirectional AlGaN/GaN HEMTs
topic Applied Physics
url https://arxiv.org/abs/2304.04648