Femtosecond reduction of atomic scattering factors triggered by intense x-ray pulse

Fuente: arXiv
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Hauptverfasser: Inoue, Ichiro, Yamada, Jumpei, Kapcia, Konrad J., Stransky, Michal, Tkachenko, Victor, Jurek, Zoltan, Inoue, Takato, Osaka, Taito, Inubushi, Yuichi, Ito, Atsuki, Tanaka, Yuto, Matsuyama, Satoshi, Yamauchi, Kazuto, Yabashi, Makina, Ziaja, Beata
Format: Preprint
Veröffentlicht: 2023
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author Inoue, Ichiro
Yamada, Jumpei
Kapcia, Konrad J.
Stransky, Michal
Tkachenko, Victor
Jurek, Zoltan
Inoue, Takato
Osaka, Taito
Inubushi, Yuichi
Ito, Atsuki
Tanaka, Yuto
Matsuyama, Satoshi
Yamauchi, Kazuto
Yabashi, Makina
Ziaja, Beata
author_facet Inoue, Ichiro
Yamada, Jumpei
Kapcia, Konrad J.
Stransky, Michal
Tkachenko, Victor
Jurek, Zoltan
Inoue, Takato
Osaka, Taito
Inubushi, Yuichi
Ito, Atsuki
Tanaka, Yuto
Matsuyama, Satoshi
Yamauchi, Kazuto
Yabashi, Makina
Ziaja, Beata
contents X-ray diffraction of silicon irradiated with tightly focused femtosecond x-ray pulses (photon energy: 11.5 keV, pulse duration: 6 fs) was measured at various x-ray intensities up to $4.6\times10^{19}$ W/cm$^2$. The measurement reveals that the diffraction intensity is highly suppressed when the x-ray intensity reaches of the order of $10^{19}$ W/cm$^2$. With a dedicated simulation, we confirm the observed reduction of the diffraction intensity is attributed to the femtosecond change in individual atomic scattering factors due to the ultrafast creation of highly ionized atoms through photoionization, Auger decay, and subsequent collisional ionization. We anticipate that this ultrafast reduction of atomic scattering factor will be a basis for new x-ray nonlinear techniques, such as pulse shortening and contrast variation x-ray scattering.
format Preprint
id arxiv_https___arxiv_org_abs_2304_05948
institution arXiv
publishDate 2023
record_format arxiv
spellingShingle Femtosecond reduction of atomic scattering factors triggered by intense x-ray pulse
Inoue, Ichiro
Yamada, Jumpei
Kapcia, Konrad J.
Stransky, Michal
Tkachenko, Victor
Jurek, Zoltan
Inoue, Takato
Osaka, Taito
Inubushi, Yuichi
Ito, Atsuki
Tanaka, Yuto
Matsuyama, Satoshi
Yamauchi, Kazuto
Yabashi, Makina
Ziaja, Beata
Atomic Physics
Optics
Plasma Physics
X-ray diffraction of silicon irradiated with tightly focused femtosecond x-ray pulses (photon energy: 11.5 keV, pulse duration: 6 fs) was measured at various x-ray intensities up to $4.6\times10^{19}$ W/cm$^2$. The measurement reveals that the diffraction intensity is highly suppressed when the x-ray intensity reaches of the order of $10^{19}$ W/cm$^2$. With a dedicated simulation, we confirm the observed reduction of the diffraction intensity is attributed to the femtosecond change in individual atomic scattering factors due to the ultrafast creation of highly ionized atoms through photoionization, Auger decay, and subsequent collisional ionization. We anticipate that this ultrafast reduction of atomic scattering factor will be a basis for new x-ray nonlinear techniques, such as pulse shortening and contrast variation x-ray scattering.
title Femtosecond reduction of atomic scattering factors triggered by intense x-ray pulse
topic Atomic Physics
Optics
Plasma Physics
url https://arxiv.org/abs/2304.05948