In-situ study and modeling of the reaction kinetics during molecular beam epitaxy of GeO2 and its etching by Ge

Fuente: arXiv

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Bibliographic Details
Main Authors:	Chen, Wenshan, Egbo, Kingsley, Tornatzky, Hans, Ramsteiner, Manfred, Wagner, Markus R., Bierwagen, Oliver
Format:	Preprint
Published:	2023
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2304.11097