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Main Authors: Hyun, Jeeho, Kim, Sangyun, Jeon, Giyoung, Kim, Seung Hwan, Bae, Kyunghoon, Kang, Byung Jun
Format: Preprint
Published: 2023
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Online Access:https://arxiv.org/abs/2305.16713
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author Hyun, Jeeho
Kim, Sangyun
Jeon, Giyoung
Kim, Seung Hwan
Bae, Kyunghoon
Kang, Byung Jun
author_facet Hyun, Jeeho
Kim, Sangyun
Jeon, Giyoung
Kim, Seung Hwan
Bae, Kyunghoon
Kang, Byung Jun
contents Anomaly detection is crucial to the advanced identification of product defects such as incorrect parts, misaligned components, and damages in industrial manufacturing. Due to the rare observations and unknown types of defects, anomaly detection is considered to be challenging in machine learning. To overcome this difficulty, recent approaches utilize the common visual representations pre-trained from natural image datasets and distill the relevant features. However, existing approaches still have the discrepancy between the pre-trained feature and the target data, or require the input augmentation which should be carefully designed, particularly for the industrial dataset. In this paper, we introduce ReConPatch, which constructs discriminative features for anomaly detection by training a linear modulation of patch features extracted from the pre-trained model. ReConPatch employs contrastive representation learning to collect and distribute features in a way that produces a target-oriented and easily separable representation. To address the absence of labeled pairs for the contrastive learning, we utilize two similarity measures between data representations, pairwise and contextual similarities, as pseudo-labels. Our method achieves the state-of-the-art anomaly detection performance (99.72%) for the widely used and challenging MVTec AD dataset. Additionally, we achieved a state-of-the-art anomaly detection performance (95.8%) for the BTAD dataset.
format Preprint
id arxiv_https___arxiv_org_abs_2305_16713
institution arXiv
publishDate 2023
record_format arxiv
spellingShingle ReConPatch : Contrastive Patch Representation Learning for Industrial Anomaly Detection
Hyun, Jeeho
Kim, Sangyun
Jeon, Giyoung
Kim, Seung Hwan
Bae, Kyunghoon
Kang, Byung Jun
Computer Vision and Pattern Recognition
Anomaly detection is crucial to the advanced identification of product defects such as incorrect parts, misaligned components, and damages in industrial manufacturing. Due to the rare observations and unknown types of defects, anomaly detection is considered to be challenging in machine learning. To overcome this difficulty, recent approaches utilize the common visual representations pre-trained from natural image datasets and distill the relevant features. However, existing approaches still have the discrepancy between the pre-trained feature and the target data, or require the input augmentation which should be carefully designed, particularly for the industrial dataset. In this paper, we introduce ReConPatch, which constructs discriminative features for anomaly detection by training a linear modulation of patch features extracted from the pre-trained model. ReConPatch employs contrastive representation learning to collect and distribute features in a way that produces a target-oriented and easily separable representation. To address the absence of labeled pairs for the contrastive learning, we utilize two similarity measures between data representations, pairwise and contextual similarities, as pseudo-labels. Our method achieves the state-of-the-art anomaly detection performance (99.72%) for the widely used and challenging MVTec AD dataset. Additionally, we achieved a state-of-the-art anomaly detection performance (95.8%) for the BTAD dataset.
title ReConPatch : Contrastive Patch Representation Learning for Industrial Anomaly Detection
topic Computer Vision and Pattern Recognition
url https://arxiv.org/abs/2305.16713