Dynamic Versus Static Oxidation of Nb/Al-AlOx/Nb Trilayer

Fuente: arXiv
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Autori principali: Farrahi, Tannaz, Kleinsasser, Alan W., Cyberey, Michael, Wang, Jie, Eller, Micahel B., Zhang, Jian Z., Kerr, Anthony R., Lambert, Joseph G., Weikle, Robert M., Lichtenberger, Arthur W.
Natura: Preprint
Pubblicazione: 2023
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author Farrahi, Tannaz
Kleinsasser, Alan W.
Cyberey, Michael
Wang, Jie
Eller, Micahel B.
Zhang, Jian Z.
Kerr, Anthony R.
Lambert, Joseph G.
Weikle, Robert M.
Lichtenberger, Arthur W.
author_facet Farrahi, Tannaz
Kleinsasser, Alan W.
Cyberey, Michael
Wang, Jie
Eller, Micahel B.
Zhang, Jian Z.
Kerr, Anthony R.
Lambert, Joseph G.
Weikle, Robert M.
Lichtenberger, Arthur W.
contents High quality Nb-based superconductor-insulator-superconductor (SIS) junctions with Al oxide (AlO$_x$) tunnel barriers grown from Al overlayers are widely reported in the literature. However, the thin barriers required for high critical current density (J$_c$) junctions exhibit defects that result in significant subgap leakage current that is detrimental for many applications. High quality, high-J$_c$ junctions can be realized with AlN$_x$ barriers, but control of J$_c$ is more difficult than with AlO$_x$. It is therefore of interest to study the growth of thin AlO$_x$ barriers with the ultimate goal of achieving high quality, high-J$_c$ AlO$_x$ junctions. In this work, 100\%\ O$_2$ and 2\%\ O$_2$ in Ar gas mixtures are used both statically and dynamically to grow AlO$_x$ tunnel barriers over a large range of oxygen exposures. In situ ellipsometry is used for the first time to extensively measure AlO$_x$ tunnel barrier growth in real time, revealing a number of unexpected patterns. Finally, a set of test junction wafers was fabricated that exhibited the well-known dependence of J$_c$ on oxygen exposure (E) in order to further validate the experimental setup.
format Preprint
id arxiv_https___arxiv_org_abs_2306_12684
institution arXiv
publishDate 2023
record_format arxiv
spellingShingle Dynamic Versus Static Oxidation of Nb/Al-AlOx/Nb Trilayer
Farrahi, Tannaz
Kleinsasser, Alan W.
Cyberey, Michael
Wang, Jie
Eller, Micahel B.
Zhang, Jian Z.
Kerr, Anthony R.
Lambert, Joseph G.
Weikle, Robert M.
Lichtenberger, Arthur W.
Superconductivity
High quality Nb-based superconductor-insulator-superconductor (SIS) junctions with Al oxide (AlO$_x$) tunnel barriers grown from Al overlayers are widely reported in the literature. However, the thin barriers required for high critical current density (J$_c$) junctions exhibit defects that result in significant subgap leakage current that is detrimental for many applications. High quality, high-J$_c$ junctions can be realized with AlN$_x$ barriers, but control of J$_c$ is more difficult than with AlO$_x$. It is therefore of interest to study the growth of thin AlO$_x$ barriers with the ultimate goal of achieving high quality, high-J$_c$ AlO$_x$ junctions. In this work, 100\%\ O$_2$ and 2\%\ O$_2$ in Ar gas mixtures are used both statically and dynamically to grow AlO$_x$ tunnel barriers over a large range of oxygen exposures. In situ ellipsometry is used for the first time to extensively measure AlO$_x$ tunnel barrier growth in real time, revealing a number of unexpected patterns. Finally, a set of test junction wafers was fabricated that exhibited the well-known dependence of J$_c$ on oxygen exposure (E) in order to further validate the experimental setup.
title Dynamic Versus Static Oxidation of Nb/Al-AlOx/Nb Trilayer
topic Superconductivity
url https://arxiv.org/abs/2306.12684