High-speed metasurface modulator using critically coupled bimodal plasmonic resonance
Fuente:
arXiv
Guardado en:
| Autores principales: | , , , , , , |
|---|---|
| Formato: | Preprint |
| Publicado: |
2023
|
| Materias: | |
| Acceso en línea: | |
| Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
| _version_ | 1866909068163022848 |
|---|---|
| author | Zhang, Jiaqi Kosugi, Yuji Ogasawara, Makoto Otomo, Akira Yamada, Toshiki Nakano, Yoshiaki Tanemura, Takuo |
| author_facet | Zhang, Jiaqi Kosugi, Yuji Ogasawara, Makoto Otomo, Akira Yamada, Toshiki Nakano, Yoshiaki Tanemura, Takuo |
| contents | Free-space electro-optic (EO) modulators operating at gigahertz and beyond are attractive for a wide range of emerging applications, including high-speed imaging, free-space optical communication, microwave photonics, and diffractive computing. Here we experimentally demonstrate a high-speed plasmonic metasurface EO modulator operating at a near-infrared wavelength range with a gigahertz modulation bandwidth. To achieve efficient intensity modulation of reflected light from an ultrathin metasurface layer, we utilize the bimodal plasmonic resonance inside a subwavelength metal-insulator-metal grating, which is precisely tuned to satisfy the critical coupling condition. As a result, perfect absorption of -27 dB (99.8%) and a high quality (Q) factor of 113 are obtained at a resonant wavelength of 1650 nm. By incorporating an EO polymer inside the grating, we achieve a modulation depth of up to 9.5 dB under an applied voltage of $\pm$30 V. The 3-dB modulation bandwidth is confirmed to be 1.25 GHz, which is primarily limited by the undesired contact resistance. Owing to the high electrical conductivity of metallic gratings and a compact device structure with a minimal parasitic capacitance, the demonstrated device can potentially operate at several tens of gigahertz, which opens up exciting opportunities for ultrahigh-speed active metasurface devices in various applications. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2309_04835 |
| institution | arXiv |
| publishDate | 2023 |
| record_format | arxiv |
| spellingShingle | High-speed metasurface modulator using critically coupled bimodal plasmonic resonance Zhang, Jiaqi Kosugi, Yuji Ogasawara, Makoto Otomo, Akira Yamada, Toshiki Nakano, Yoshiaki Tanemura, Takuo Optics Applied Physics Free-space electro-optic (EO) modulators operating at gigahertz and beyond are attractive for a wide range of emerging applications, including high-speed imaging, free-space optical communication, microwave photonics, and diffractive computing. Here we experimentally demonstrate a high-speed plasmonic metasurface EO modulator operating at a near-infrared wavelength range with a gigahertz modulation bandwidth. To achieve efficient intensity modulation of reflected light from an ultrathin metasurface layer, we utilize the bimodal plasmonic resonance inside a subwavelength metal-insulator-metal grating, which is precisely tuned to satisfy the critical coupling condition. As a result, perfect absorption of -27 dB (99.8%) and a high quality (Q) factor of 113 are obtained at a resonant wavelength of 1650 nm. By incorporating an EO polymer inside the grating, we achieve a modulation depth of up to 9.5 dB under an applied voltage of $\pm$30 V. The 3-dB modulation bandwidth is confirmed to be 1.25 GHz, which is primarily limited by the undesired contact resistance. Owing to the high electrical conductivity of metallic gratings and a compact device structure with a minimal parasitic capacitance, the demonstrated device can potentially operate at several tens of gigahertz, which opens up exciting opportunities for ultrahigh-speed active metasurface devices in various applications. |
| title | High-speed metasurface modulator using critically coupled bimodal plasmonic resonance |
| topic | Optics Applied Physics |
| url | https://arxiv.org/abs/2309.04835 |