Algorithm-Based Linearly Graded Compositions of GeSn on GaAs (001) via Molecular Beam Epitaxy

Fuente: arXiv
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Hauptverfasser: Gunder, Calbi, Alavijeh, Mohammad Zamani, Wangila, Emmanuel, de Oliveira, Fernando Maia, Sheibani, Aida, Kryvyi, Serhii, Attwood, Paul C., Mazur, Yuriy I., Yu, Shui-Qing, Salamo, Gregory J.
Format: Preprint
Veröffentlicht: 2023
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author Gunder, Calbi
Alavijeh, Mohammad Zamani
Wangila, Emmanuel
de Oliveira, Fernando Maia
Sheibani, Aida
Kryvyi, Serhii
Attwood, Paul C.
Mazur, Yuriy I.
Yu, Shui-Qing
Salamo, Gregory J.
author_facet Gunder, Calbi
Alavijeh, Mohammad Zamani
Wangila, Emmanuel
de Oliveira, Fernando Maia
Sheibani, Aida
Kryvyi, Serhii
Attwood, Paul C.
Mazur, Yuriy I.
Yu, Shui-Qing
Salamo, Gregory J.
contents The growth of high-composition GeSn films of the future will likely be guided via algorithms. In this study we show how a logarithmic-based algorithm can be used to obtain high-quality GeSn compositions up to 16 % on GaAs (001) substrates via molecular beam epitaxy. Within we demonstrate composition targeting and logarithmic gradients to achieve linearly graded pseudomorph Ge1-xSnx compositions up to 10 % before partial relaxation of the structure and a continued gradient up to 16 % GeSn. In this report, we use X-ray diffraction, simulation, SIMS and atomic force microscopy to analyze and demonstrate some of the possible growths that can be produced with the enclosed algorithm. This methodology of growth is a major step forward in the field of GeSn development and the first demonstration of algorithmically driven, linearly graded GeSn films.
format Preprint
id arxiv_https___arxiv_org_abs_2309_06695
institution arXiv
publishDate 2023
record_format arxiv
spellingShingle Algorithm-Based Linearly Graded Compositions of GeSn on GaAs (001) via Molecular Beam Epitaxy
Gunder, Calbi
Alavijeh, Mohammad Zamani
Wangila, Emmanuel
de Oliveira, Fernando Maia
Sheibani, Aida
Kryvyi, Serhii
Attwood, Paul C.
Mazur, Yuriy I.
Yu, Shui-Qing
Salamo, Gregory J.
Materials Science
Applied Physics
The growth of high-composition GeSn films of the future will likely be guided via algorithms. In this study we show how a logarithmic-based algorithm can be used to obtain high-quality GeSn compositions up to 16 % on GaAs (001) substrates via molecular beam epitaxy. Within we demonstrate composition targeting and logarithmic gradients to achieve linearly graded pseudomorph Ge1-xSnx compositions up to 10 % before partial relaxation of the structure and a continued gradient up to 16 % GeSn. In this report, we use X-ray diffraction, simulation, SIMS and atomic force microscopy to analyze and demonstrate some of the possible growths that can be produced with the enclosed algorithm. This methodology of growth is a major step forward in the field of GeSn development and the first demonstration of algorithmically driven, linearly graded GeSn films.
title Algorithm-Based Linearly Graded Compositions of GeSn on GaAs (001) via Molecular Beam Epitaxy
topic Materials Science
Applied Physics
url https://arxiv.org/abs/2309.06695