Simulating the secondary electron avalanche of MCP by Geant4
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arXiv
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| Auteurs principaux: | , , , , |
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| Format: | Preprint |
| Publié: |
2023
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| _version_ | 1866914815739428864 |
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| author | Peng, Huaxing Yan, Baojun Miao, Han Liu, Shulin Zhang, Binting |
| author_facet | Peng, Huaxing Yan, Baojun Miao, Han Liu, Shulin Zhang, Binting |
| contents | Nowadays, Microchannel Plate (MCP), as a kind of electron multipliers based on the secondary electron emission, is widely used in many high-sensitive experiments, such as neutrino detection, which require the noise to be as low as possible, while the conventional straight-channel MCP will inevitably have ion feedback, resulting in the sequential after-pulses being the major source of noise. Normally, the problem can be effectively avoided by coupling two straight-channel MCPs in cascade and combining the channels into a `V` shape known as chevron MCPs, but this method is limited by the manufacturing techniques due to the unavoidable gap between the two pieces that will worsen the resolution and peak-to-valley ratio. However, the ion feedback can be inhibited significantly for MCPs with curved channels. Based on Geant4, we investigate how the geometrical parameters of curved-channel MCP influence the gain and get the optimum pore diameter for an MCP to reach the maximum gain with fixed thickness and applied voltage. Additionally, the track-by-track simulation reveals that the average acceleration distance of a secondary electron inside the curved-channel is approximately 20 um when the applied voltage, length-to-diameter ratio and pore diameter are 950 V, 50:1 and 20 um, respectively. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2310_07153 |
| institution | arXiv |
| publishDate | 2023 |
| record_format | arxiv |
| spellingShingle | Simulating the secondary electron avalanche of MCP by Geant4 Peng, Huaxing Yan, Baojun Miao, Han Liu, Shulin Zhang, Binting Instrumentation and Detectors Nowadays, Microchannel Plate (MCP), as a kind of electron multipliers based on the secondary electron emission, is widely used in many high-sensitive experiments, such as neutrino detection, which require the noise to be as low as possible, while the conventional straight-channel MCP will inevitably have ion feedback, resulting in the sequential after-pulses being the major source of noise. Normally, the problem can be effectively avoided by coupling two straight-channel MCPs in cascade and combining the channels into a `V` shape known as chevron MCPs, but this method is limited by the manufacturing techniques due to the unavoidable gap between the two pieces that will worsen the resolution and peak-to-valley ratio. However, the ion feedback can be inhibited significantly for MCPs with curved channels. Based on Geant4, we investigate how the geometrical parameters of curved-channel MCP influence the gain and get the optimum pore diameter for an MCP to reach the maximum gain with fixed thickness and applied voltage. Additionally, the track-by-track simulation reveals that the average acceleration distance of a secondary electron inside the curved-channel is approximately 20 um when the applied voltage, length-to-diameter ratio and pore diameter are 950 V, 50:1 and 20 um, respectively. |
| title | Simulating the secondary electron avalanche of MCP by Geant4 |
| topic | Instrumentation and Detectors |
| url | https://arxiv.org/abs/2310.07153 |