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Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H$_2$ and SF$_6$ plasmas

Fuente: arXiv

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Detalles Bibliográficos
Autores principales:	Chen, Ivy I., Solgaard, Jennifer, Sekine, Ryoto, Hossain, Azmain A., Ardizzi, Anthony, Catherall, David S., Marandi, Alireza, Renzas, James R., Greer, Frank, Minnich, Austin J.
Formato:	Preprint
Publicado:	2023
Materias:	Mesoscale and Nanoscale Physics Materials Science Optics
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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