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Autori principali: Han, Yuyang, Pederson, Christian, Matthews, Bethany E., Yama, Nicholas S., Parsons, Maxwell F., Fu, Kai-Mei C.
Natura: Preprint
Pubblicazione: 2023
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Accesso online:https://arxiv.org/abs/2310.12484
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author Han, Yuyang
Pederson, Christian
Matthews, Bethany E.
Yama, Nicholas S.
Parsons, Maxwell F.
Fu, Kai-Mei C.
author_facet Han, Yuyang
Pederson, Christian
Matthews, Bethany E.
Yama, Nicholas S.
Parsons, Maxwell F.
Fu, Kai-Mei C.
contents The need of near-surface color centers in diamond for quantum technologies motivates the controlled doping of specific extrinsic impurities into the crystal lattice. Recent experiments have shown that this can be achieved by momentum transfer from a surface precursor via ion implantation, an approach known as ``recoil implantation.'' Here, we extend this technique to incorporate dielectric precursors for creating nitrogen-vacancy (NV) and silicon-vacancy (SiV) centers in diamond. Specifically, we demonstrate that gallium focused-ion-beam exposure to a thin layer of silicon nitride or silicon dioxide on the diamond surface results in the introduction of both extrinsic impurities and carbon vacancies. These defects subsequently give rise to near-surface NV and SiV centers with desirable optical properties after annealing.
format Preprint
id arxiv_https___arxiv_org_abs_2310_12484
institution arXiv
publishDate 2023
record_format arxiv
spellingShingle Creation of color centers in diamond by recoil implantation through dielectric films
Han, Yuyang
Pederson, Christian
Matthews, Bethany E.
Yama, Nicholas S.
Parsons, Maxwell F.
Fu, Kai-Mei C.
Quantum Physics
The need of near-surface color centers in diamond for quantum technologies motivates the controlled doping of specific extrinsic impurities into the crystal lattice. Recent experiments have shown that this can be achieved by momentum transfer from a surface precursor via ion implantation, an approach known as ``recoil implantation.'' Here, we extend this technique to incorporate dielectric precursors for creating nitrogen-vacancy (NV) and silicon-vacancy (SiV) centers in diamond. Specifically, we demonstrate that gallium focused-ion-beam exposure to a thin layer of silicon nitride or silicon dioxide on the diamond surface results in the introduction of both extrinsic impurities and carbon vacancies. These defects subsequently give rise to near-surface NV and SiV centers with desirable optical properties after annealing.
title Creation of color centers in diamond by recoil implantation through dielectric films
topic Quantum Physics
url https://arxiv.org/abs/2310.12484