Unveiling microstructural damage for leakage current degradation in SiC Schottky diode after heavy ions irradiation under 200 V
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arXiv
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| Main Authors: | , , , , , , , , , , |
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| Format: | Preprint |
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2023
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| _version_ | 1866911964406480896 |
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| author | Yan, Xiaoyu Zhai, Pengfei Yang, Chen Zhao, Shiwei Nan, Shuai Hu, Peipei Zhang, Teng Chen, Qiyu Xu, Lijun Li, Zongzhen Liu, Jie |
| author_facet | Yan, Xiaoyu Zhai, Pengfei Yang, Chen Zhao, Shiwei Nan, Shuai Hu, Peipei Zhang, Teng Chen, Qiyu Xu, Lijun Li, Zongzhen Liu, Jie |
| contents | Single-event burnout and single-event leakage current (SELC) in SiC power devices induced by heavy ions severely limit their space application, and the underlying mechanism is still unclear. One fundamental problem is lack of high-resolution characterization of radiation damage in the irradiated SiC power devices, which is a crucial indicator of the related mechanism. In this letter, high-resolution transmission electron microscopy (TEM) was used to characterize the radiation damage in the 1437.6 MeV 181Ta-irradiated SiC junction barrier Schottky diode under 200 V. The amorphous radiation damage with about 52 nm in diameter and 121 nm in length at the Schottky metal (Ti)-semiconductor (SiC) interface was observed. More importantly, in the damage site the atomic mixing of Ti, Si, and C was identified by electron energy loss spectroscopy and high-angle annular dark-field scanning TEM. It indicates that the melting of the Ti-SiC interface induced by localized Joule heating is responsible for the amorphization and the formation of titanium silicide, titanium carbide, or ternary phases. These modifications at nanoscale in turn cause the localized degradation of the Schottky contact, resulting in the permanent increase in leakage current. This experimental study provides very valuable clues to thorough understanding of the SELC mechanism in SiC diode. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2310_17145 |
| institution | arXiv |
| publishDate | 2023 |
| record_format | arxiv |
| spellingShingle | Unveiling microstructural damage for leakage current degradation in SiC Schottky diode after heavy ions irradiation under 200 V Yan, Xiaoyu Zhai, Pengfei Yang, Chen Zhao, Shiwei Nan, Shuai Hu, Peipei Zhang, Teng Chen, Qiyu Xu, Lijun Li, Zongzhen Liu, Jie Materials Science Applied Physics Single-event burnout and single-event leakage current (SELC) in SiC power devices induced by heavy ions severely limit their space application, and the underlying mechanism is still unclear. One fundamental problem is lack of high-resolution characterization of radiation damage in the irradiated SiC power devices, which is a crucial indicator of the related mechanism. In this letter, high-resolution transmission electron microscopy (TEM) was used to characterize the radiation damage in the 1437.6 MeV 181Ta-irradiated SiC junction barrier Schottky diode under 200 V. The amorphous radiation damage with about 52 nm in diameter and 121 nm in length at the Schottky metal (Ti)-semiconductor (SiC) interface was observed. More importantly, in the damage site the atomic mixing of Ti, Si, and C was identified by electron energy loss spectroscopy and high-angle annular dark-field scanning TEM. It indicates that the melting of the Ti-SiC interface induced by localized Joule heating is responsible for the amorphization and the formation of titanium silicide, titanium carbide, or ternary phases. These modifications at nanoscale in turn cause the localized degradation of the Schottky contact, resulting in the permanent increase in leakage current. This experimental study provides very valuable clues to thorough understanding of the SELC mechanism in SiC diode. |
| title | Unveiling microstructural damage for leakage current degradation in SiC Schottky diode after heavy ions irradiation under 200 V |
| topic | Materials Science Applied Physics |
| url | https://arxiv.org/abs/2310.17145 |