Fabrication of quantum emitters in aluminium nitride by Al-ion implantation and thermal annealing

Fuente: arXiv
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Main Authors: Hernández, E. Nieto, Yağcı, H. B., Pugliese, V., Aprà, P., Cannon, J. K., Bishop, S. G., Hadden, J., Tchernij, S. Ditalia, Olivero, Bennett, A. J., Forneris, J.
Format: Preprint
Published: 2023
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author Hernández, E. Nieto
Yağcı, H. B.
Pugliese, V.
Aprà, P.
Cannon, J. K.
Bishop, S. G.
Hadden, J.
Tchernij, S. Ditalia
Olivero
Bennett, A. J.
Forneris, J.
author_facet Hernández, E. Nieto
Yağcı, H. B.
Pugliese, V.
Aprà, P.
Cannon, J. K.
Bishop, S. G.
Hadden, J.
Tchernij, S. Ditalia
Olivero
Bennett, A. J.
Forneris, J.
contents Single-photon emitters (SPEs) within wide-bandgap materials represent an appealing platform for the development of single-photon sources operating at room temperatures. Group III- nitrides have previously been shown to host efficient SPEs which are attributed to deep energy levels within the large bandgap of the material, in a way that is similar to extensively investigated colour centres in diamond. Anti-bunched emission from defect centres within gallium nitride (GaN) and aluminium nitride (AlN) have been recently demonstrated. While such emitters are particularly interesting due to the compatibility of III-nitrides with cleanroom processes, the nature of such defects and the optimal conditions for forming them are not fully understood. Here, we investigate Al implantation on a commercial AlN epilayer through subsequent steps of thermal annealing and confocal microscopy measurements. We observe a fluence-dependent increase in the density of the emitters, resulting in creation of ensembles at the maximum implantation fluence. Annealing at 600 °C results in the optimal yield in SPEs formation at the maximum fluence, while a significant reduction in SPE density is observed at lower fluences. These findings suggest that the mechanism of vacancy formation plays a key role in the creation of the emitters, and open new perspectives in the defect engineering of SPEs in solid state.
format Preprint
id arxiv_https___arxiv_org_abs_2310_20540
institution arXiv
publishDate 2023
record_format arxiv
spellingShingle Fabrication of quantum emitters in aluminium nitride by Al-ion implantation and thermal annealing
Hernández, E. Nieto
Yağcı, H. B.
Pugliese, V.
Aprà, P.
Cannon, J. K.
Bishop, S. G.
Hadden, J.
Tchernij, S. Ditalia
Olivero
Bennett, A. J.
Forneris, J.
Applied Physics
Materials Science
Quantum Physics
Single-photon emitters (SPEs) within wide-bandgap materials represent an appealing platform for the development of single-photon sources operating at room temperatures. Group III- nitrides have previously been shown to host efficient SPEs which are attributed to deep energy levels within the large bandgap of the material, in a way that is similar to extensively investigated colour centres in diamond. Anti-bunched emission from defect centres within gallium nitride (GaN) and aluminium nitride (AlN) have been recently demonstrated. While such emitters are particularly interesting due to the compatibility of III-nitrides with cleanroom processes, the nature of such defects and the optimal conditions for forming them are not fully understood. Here, we investigate Al implantation on a commercial AlN epilayer through subsequent steps of thermal annealing and confocal microscopy measurements. We observe a fluence-dependent increase in the density of the emitters, resulting in creation of ensembles at the maximum implantation fluence. Annealing at 600 °C results in the optimal yield in SPEs formation at the maximum fluence, while a significant reduction in SPE density is observed at lower fluences. These findings suggest that the mechanism of vacancy formation plays a key role in the creation of the emitters, and open new perspectives in the defect engineering of SPEs in solid state.
title Fabrication of quantum emitters in aluminium nitride by Al-ion implantation and thermal annealing
topic Applied Physics
Materials Science
Quantum Physics
url https://arxiv.org/abs/2310.20540