Molecular beam epitaxy growth of superconducting tantalum germanide

Fuente: arXiv
Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Strohbeen, Patrick J., Banerjee, Tathagata, Brook, Aurelia M., Levy, Ido, Sarney, Wendy L., van Dijk, Jechiel, Orth, Hayden, Mikalsen, Melissa, Fatemi, Valla, Shabani, Javad
Format: Preprint
Veröffentlicht: 2023
Schlagworte:
Online-Zugang:
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
_version_ 1866916501923037184
author Strohbeen, Patrick J.
Banerjee, Tathagata
Brook, Aurelia M.
Levy, Ido
Sarney, Wendy L.
van Dijk, Jechiel
Orth, Hayden
Mikalsen, Melissa
Fatemi, Valla
Shabani, Javad
author_facet Strohbeen, Patrick J.
Banerjee, Tathagata
Brook, Aurelia M.
Levy, Ido
Sarney, Wendy L.
van Dijk, Jechiel
Orth, Hayden
Mikalsen, Melissa
Fatemi, Valla
Shabani, Javad
contents Developing new material platforms for use in superconductor-semiconductor hybrid structures is desirable due to limitations caused by intrinsic microwave losses present in commonly used III/V material systems. With the recent reports on tantalum superconducting qubits that show improvements over the Nb and Al counterparts, exploring Ta as an alternative superconductor in hybrid material systems is promising. Here, we study the growth of Ta on semiconducting Ge (001) substrates grown via molecular beam epitaxy. We show that at a growth temperature of 400$^{\circ}$C the Ta diffuses into the Ge matrix in a self-limiting nature resulting in smooth and abrupt surfaces and interfaces with roughness on the order of 3-7 Å as measured by atomic force microscopy and x-ray reflectivity. The films are found to be a mixture of Ta$_{5}$Ge$_{3}$ and TaGe$_{2}$ binary alloys and form a native oxide that seems to form a sharp interface with the underlying film. These films are superconducting with a $T_{C}\sim 1.8-2$K and $H_{C}^{\perp} \sim 1.88T$, $H_{C}^{\parallel} \sim 5.1T$. These results show this tantalum germanide film to be promising for future superconducting quantum information platforms.
format Preprint
id arxiv_https___arxiv_org_abs_2312_01038
institution arXiv
publishDate 2023
record_format arxiv
spellingShingle Molecular beam epitaxy growth of superconducting tantalum germanide
Strohbeen, Patrick J.
Banerjee, Tathagata
Brook, Aurelia M.
Levy, Ido
Sarney, Wendy L.
van Dijk, Jechiel
Orth, Hayden
Mikalsen, Melissa
Fatemi, Valla
Shabani, Javad
Mesoscale and Nanoscale Physics
Materials Science
Superconductivity
Developing new material platforms for use in superconductor-semiconductor hybrid structures is desirable due to limitations caused by intrinsic microwave losses present in commonly used III/V material systems. With the recent reports on tantalum superconducting qubits that show improvements over the Nb and Al counterparts, exploring Ta as an alternative superconductor in hybrid material systems is promising. Here, we study the growth of Ta on semiconducting Ge (001) substrates grown via molecular beam epitaxy. We show that at a growth temperature of 400$^{\circ}$C the Ta diffuses into the Ge matrix in a self-limiting nature resulting in smooth and abrupt surfaces and interfaces with roughness on the order of 3-7 Å as measured by atomic force microscopy and x-ray reflectivity. The films are found to be a mixture of Ta$_{5}$Ge$_{3}$ and TaGe$_{2}$ binary alloys and form a native oxide that seems to form a sharp interface with the underlying film. These films are superconducting with a $T_{C}\sim 1.8-2$K and $H_{C}^{\perp} \sim 1.88T$, $H_{C}^{\parallel} \sim 5.1T$. These results show this tantalum germanide film to be promising for future superconducting quantum information platforms.
title Molecular beam epitaxy growth of superconducting tantalum germanide
topic Mesoscale and Nanoscale Physics
Materials Science
Superconductivity
url https://arxiv.org/abs/2312.01038