Saved in:
Bibliographic Details
Main Authors: Tyson, Kurt H., Godfrey, James R., Fraser, James M., Knobel, Robert G.
Format: Preprint
Published: 2024
Subjects:
Online Access:https://arxiv.org/abs/2401.06231
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1866910618893680640
author Tyson, Kurt H.
Godfrey, James R.
Fraser, James M.
Knobel, Robert G.
author_facet Tyson, Kurt H.
Godfrey, James R.
Fraser, James M.
Knobel, Robert G.
contents Monolayer semiconducting transition metal dichalcogenides (S-TMDs) have been extensively studied as materials for next-generation optoelectronic devices due to their direct band gap and high exciton binding energy at room temperature. Under a superacid treatment of bis(trifluoromethane)sulfonimide (TFSI), sulfur-based TMDs such as MoS$_2$ can emit strong photoluminescence (PL) with photoluminescence quantum yield (PLQY) approaching unity. However, the magnitude of PL enhancement varies by more than two orders of magnitude in published reports. A major culprit behind the discrepancy is sulfur-based TMD's sensitivity to above band-gap photostimulation. Here, we present a detailed study of how TFSI-treated MoS$_2$ reacts to photostimulation with increasing PL occurring hours after constant or pulsed laser exposure. The PL of TFSI-treated MoS$_2$ is enhanced up to 74 times its initial intensity after 5 hours of continuous exposure to 532nm laser light. Photostimulation also enhances the PL of untreated MoS$_2$ but with a much smaller enhancement. Caution should be taken when probing MoS$_2$ PL spectra as above-bandgap light can alter the resulting intensity and peak wavelength of the emission over time. The presence of air is verified to play a key role in the photostimulated enhancement effect. Additionally, the rise of PL intensity is mirrored by an increase in measured carrier lifetime of up to ~400ps consistent with the suppression of non-radiative pathways. This work demonstrates why variations in PL intensity are observed across samples and provides an understanding of the changes in carrier lifetimes to better engineer next-generation optoelectronic devices.
format Preprint
id arxiv_https___arxiv_org_abs_2401_06231
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Localized Gradual Photomediated Brightness and Lifetime Increase of Superacid Treated Monolayer MoS$_2$
Tyson, Kurt H.
Godfrey, James R.
Fraser, James M.
Knobel, Robert G.
Materials Science
Monolayer semiconducting transition metal dichalcogenides (S-TMDs) have been extensively studied as materials for next-generation optoelectronic devices due to their direct band gap and high exciton binding energy at room temperature. Under a superacid treatment of bis(trifluoromethane)sulfonimide (TFSI), sulfur-based TMDs such as MoS$_2$ can emit strong photoluminescence (PL) with photoluminescence quantum yield (PLQY) approaching unity. However, the magnitude of PL enhancement varies by more than two orders of magnitude in published reports. A major culprit behind the discrepancy is sulfur-based TMD's sensitivity to above band-gap photostimulation. Here, we present a detailed study of how TFSI-treated MoS$_2$ reacts to photostimulation with increasing PL occurring hours after constant or pulsed laser exposure. The PL of TFSI-treated MoS$_2$ is enhanced up to 74 times its initial intensity after 5 hours of continuous exposure to 532nm laser light. Photostimulation also enhances the PL of untreated MoS$_2$ but with a much smaller enhancement. Caution should be taken when probing MoS$_2$ PL spectra as above-bandgap light can alter the resulting intensity and peak wavelength of the emission over time. The presence of air is verified to play a key role in the photostimulated enhancement effect. Additionally, the rise of PL intensity is mirrored by an increase in measured carrier lifetime of up to ~400ps consistent with the suppression of non-radiative pathways. This work demonstrates why variations in PL intensity are observed across samples and provides an understanding of the changes in carrier lifetimes to better engineer next-generation optoelectronic devices.
title Localized Gradual Photomediated Brightness and Lifetime Increase of Superacid Treated Monolayer MoS$_2$
topic Materials Science
url https://arxiv.org/abs/2401.06231