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Alternating Bias Assisted Annealing of Amorphous Oxide Tunnel Junctions

Fuente: arXiv

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Détails bibliographiques
Auteurs principaux:	Pappas, David P., Field, Mark, Kopas, Cameron, Howard, Joel A., Wang, Xiqiao, Lachman, Ella, Zhou, Lin, Oh, Jinsu, Yadavalli, Kameshwar, Sete, Eyob A., Bestwick, Andrew, Kramer, Matthew J., Mutus, Joshua Y.
Format:	Preprint
Publié:	2024
Sujets:	Applied Physics Materials Science Superconductivity Quantum Physics
Accès en ligne:	Acceder al recurso
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

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