RESURF Ga$_{2}$O$_{3}$-on-SiC Field Effect Transistors for Enhanced Breakdown Voltage

Fuente: arXiv
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Autores principales: Chen, Junting, Zhao, Junlei, Wei, Jin, Hua, Mengyuan
Formato: Preprint
Publicado: 2024
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author Chen, Junting
Zhao, Junlei
Wei, Jin
Hua, Mengyuan
author_facet Chen, Junting
Zhao, Junlei
Wei, Jin
Hua, Mengyuan
contents Heterosubstrates have been extensively studied as a method to improve the heat dissipation of Ga$_{2}$O$_{3}$ devices. In this simulation work, we propose a novel role for $p$-type available heterosubstrates, as a component of a reduced surface field (RESURF) structure in Ga$_{2}$O$_{3}$ lateral field-effect transistors (FETs). The RESURF structure can eliminate the electric field crowding and contribute to higher breakdown voltage. Using SiC as an example, the designing strategy for doping concentration and dimensions of the $p$-type region is systematically studied using TCAD modeling. To mimic realistic devices, the impacts of interface charge and binding interlayer at the Ga$_{2}$O$_{3}$/SiC interface are also explored. Additionally, the feasibility of the RESURF structure for high-frequency switching operation is supported by the short time constant ($\sim$0.5 ns) of charging/discharging the $p$-SiC depletion region. This study demonstrates the great potential of utilizing the electrical properties of heat-dissipating heterosubstrates to achieve a uniform electric field distribution in Ga$_{2}$O$_{3}$ FETs.
format Preprint
id arxiv_https___arxiv_org_abs_2401_10046
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle RESURF Ga$_{2}$O$_{3}$-on-SiC Field Effect Transistors for Enhanced Breakdown Voltage
Chen, Junting
Zhao, Junlei
Wei, Jin
Hua, Mengyuan
Applied Physics
Heterosubstrates have been extensively studied as a method to improve the heat dissipation of Ga$_{2}$O$_{3}$ devices. In this simulation work, we propose a novel role for $p$-type available heterosubstrates, as a component of a reduced surface field (RESURF) structure in Ga$_{2}$O$_{3}$ lateral field-effect transistors (FETs). The RESURF structure can eliminate the electric field crowding and contribute to higher breakdown voltage. Using SiC as an example, the designing strategy for doping concentration and dimensions of the $p$-type region is systematically studied using TCAD modeling. To mimic realistic devices, the impacts of interface charge and binding interlayer at the Ga$_{2}$O$_{3}$/SiC interface are also explored. Additionally, the feasibility of the RESURF structure for high-frequency switching operation is supported by the short time constant ($\sim$0.5 ns) of charging/discharging the $p$-SiC depletion region. This study demonstrates the great potential of utilizing the electrical properties of heat-dissipating heterosubstrates to achieve a uniform electric field distribution in Ga$_{2}$O$_{3}$ FETs.
title RESURF Ga$_{2}$O$_{3}$-on-SiC Field Effect Transistors for Enhanced Breakdown Voltage
topic Applied Physics
url https://arxiv.org/abs/2401.10046