Brillouin nonlinearity characterizations of a high refractive index silicon oxynitride platform
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| Main Authors: | , , , , , , , , |
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| Format: | Preprint |
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2024
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| _version_ | 1866914657064714240 |
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| author | Ye, Kaixuan Keloth, Akshay Klaver, Yvan Baldazzi, Alessio Piccoli, Gioele Sanna, Matteo Pavesi, Lorenzo Ghulinyan, Mher Marpaung, David |
| author_facet | Ye, Kaixuan Keloth, Akshay Klaver, Yvan Baldazzi, Alessio Piccoli, Gioele Sanna, Matteo Pavesi, Lorenzo Ghulinyan, Mher Marpaung, David |
| contents | Silicon oxynitride (SiON) is a low-loss and versatile material for linear and nonlinear photonics applications. Controlling the oxygen-to-nitrogen (O/N) ratio in SiON provides an effective way to engineer its optical and mechanical properties, making it a great platform for the investigation of on-chip optomechanical interactions, especially the stimulated Brillouin scattering (SBS). Here we report the Brillouin nonlinearity characterization of a SiON platform with a specific O/N ratio (characterized by a refractive index of $n=1.65$). First, we introduce this particular SiON platform with fabrication details. Subsequently, we discuss various techniques for the on-chip Brillouin nonlinearity characterizations. In particular, we focus on the intensity-modulated pump-probe lock-in amplifier technique, which enables ultra-sensitive characterization. Finally, we analyze the Brillouin nonlinearities of this SiON platform and compare them with other SiON platforms. This work underscores the potential of SiON for on-chip Brillouin-based applications. Moreover, it paves the way for Brillouin nonlinearity characterization across various material platforms. |
| format | Preprint |
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arxiv_https___arxiv_org_abs_2401_12651 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Brillouin nonlinearity characterizations of a high refractive index silicon oxynitride platform Ye, Kaixuan Keloth, Akshay Klaver, Yvan Baldazzi, Alessio Piccoli, Gioele Sanna, Matteo Pavesi, Lorenzo Ghulinyan, Mher Marpaung, David Optics Applied Physics Silicon oxynitride (SiON) is a low-loss and versatile material for linear and nonlinear photonics applications. Controlling the oxygen-to-nitrogen (O/N) ratio in SiON provides an effective way to engineer its optical and mechanical properties, making it a great platform for the investigation of on-chip optomechanical interactions, especially the stimulated Brillouin scattering (SBS). Here we report the Brillouin nonlinearity characterization of a SiON platform with a specific O/N ratio (characterized by a refractive index of $n=1.65$). First, we introduce this particular SiON platform with fabrication details. Subsequently, we discuss various techniques for the on-chip Brillouin nonlinearity characterizations. In particular, we focus on the intensity-modulated pump-probe lock-in amplifier technique, which enables ultra-sensitive characterization. Finally, we analyze the Brillouin nonlinearities of this SiON platform and compare them with other SiON platforms. This work underscores the potential of SiON for on-chip Brillouin-based applications. Moreover, it paves the way for Brillouin nonlinearity characterization across various material platforms. |
| title | Brillouin nonlinearity characterizations of a high refractive index silicon oxynitride platform |
| topic | Optics Applied Physics |
| url | https://arxiv.org/abs/2401.12651 |