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Main Authors: Hennig, Joshua, Klier, Jens, Duran, Stefan, Hsu, Kuei-Shen, Beyer, Jan, Röder, Christian, Beyer, Franziska C., Schüler, Nadine, Vieweg, Nico, Dutzi, Katja, von Freymann, Georg, Molter, Daniel
Format: Preprint
Published: 2024
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Online Access:https://arxiv.org/abs/2401.12787
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author Hennig, Joshua
Klier, Jens
Duran, Stefan
Hsu, Kuei-Shen
Beyer, Jan
Röder, Christian
Beyer, Franziska C.
Schüler, Nadine
Vieweg, Nico
Dutzi, Katja
von Freymann, Georg
Molter, Daniel
author_facet Hennig, Joshua
Klier, Jens
Duran, Stefan
Hsu, Kuei-Shen
Beyer, Jan
Röder, Christian
Beyer, Franziska C.
Schüler, Nadine
Vieweg, Nico
Dutzi, Katja
von Freymann, Georg
Molter, Daniel
contents Resistivity is one of the most important characteristics in the semiconductor industry. The most common way to measure resistivity is the four-point probe method, which requires physical contact with the material under test. Terahertz time domain spectroscopy, a fast and non-destructive measurement method, is already well established in the characterization of dielectrics. In this work, we demonstrate the potential of two Drude model-based approaches to extract resistivity values from terahertz time-domain spectroscopy measurements of silicon in a wide range from about 10$^{-3}$ $Ω$cm to 10$^{2}$ $Ω$cm. One method is an analytical approach and the other is an optimization approach. Four-point probe measurements are used as a reference. In addition, the spatial resistivity distribution is imaged by X-Y scanning of the samples to detect inhomogeneities in the doping distribution.
format Preprint
id arxiv_https___arxiv_org_abs_2401_12787
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Wide-range resistivity characterization of semiconductors with terahertz time-domain spectroscopy
Hennig, Joshua
Klier, Jens
Duran, Stefan
Hsu, Kuei-Shen
Beyer, Jan
Röder, Christian
Beyer, Franziska C.
Schüler, Nadine
Vieweg, Nico
Dutzi, Katja
von Freymann, Georg
Molter, Daniel
Optics
Resistivity is one of the most important characteristics in the semiconductor industry. The most common way to measure resistivity is the four-point probe method, which requires physical contact with the material under test. Terahertz time domain spectroscopy, a fast and non-destructive measurement method, is already well established in the characterization of dielectrics. In this work, we demonstrate the potential of two Drude model-based approaches to extract resistivity values from terahertz time-domain spectroscopy measurements of silicon in a wide range from about 10$^{-3}$ $Ω$cm to 10$^{2}$ $Ω$cm. One method is an analytical approach and the other is an optimization approach. Four-point probe measurements are used as a reference. In addition, the spatial resistivity distribution is imaged by X-Y scanning of the samples to detect inhomogeneities in the doping distribution.
title Wide-range resistivity characterization of semiconductors with terahertz time-domain spectroscopy
topic Optics
url https://arxiv.org/abs/2401.12787