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Hauptverfasser: Fernàndez-Garrido, Sergio, Ubben, Kai U., Herfort, Jens, Gao, Cunxu, Brandt, Oliver
Format: Preprint
Veröffentlicht: 2024
Schlagworte:
Online-Zugang:https://arxiv.org/abs/2401.16887
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author Fernàndez-Garrido, Sergio
Ubben, Kai U.
Herfort, Jens
Gao, Cunxu
Brandt, Oliver
author_facet Fernàndez-Garrido, Sergio
Ubben, Kai U.
Herfort, Jens
Gao, Cunxu
Brandt, Oliver
contents We analyze the properties of Fe Schottky contacts prepared in situ on n-type GaN(0001) by molecular beam epitaxy. In particular, we investigate the suitability of these epitaxial Fe layers for electrical spin injection. Current-voltage-temperature measurements demonstrate pure field emission for Fe/GaN:Si Schottky diodes with [Si] = 5 $\times$ 10$^{18}$ cm$^{-3}$. The Schottky barrier height of the clean, epitaxial Fe/GaN interface is determined by both current-voltage-temperature and capacitance-voltage techniques to be (1.47 $\pm$ 0.09) eV.
format Preprint
id arxiv_https___arxiv_org_abs_2401_16887
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Electrical characterization of all-epitaxial Fe/GaN(0001) Schottky tunnel contacts
Fernàndez-Garrido, Sergio
Ubben, Kai U.
Herfort, Jens
Gao, Cunxu
Brandt, Oliver
Materials Science
We analyze the properties of Fe Schottky contacts prepared in situ on n-type GaN(0001) by molecular beam epitaxy. In particular, we investigate the suitability of these epitaxial Fe layers for electrical spin injection. Current-voltage-temperature measurements demonstrate pure field emission for Fe/GaN:Si Schottky diodes with [Si] = 5 $\times$ 10$^{18}$ cm$^{-3}$. The Schottky barrier height of the clean, epitaxial Fe/GaN interface is determined by both current-voltage-temperature and capacitance-voltage techniques to be (1.47 $\pm$ 0.09) eV.
title Electrical characterization of all-epitaxial Fe/GaN(0001) Schottky tunnel contacts
topic Materials Science
url https://arxiv.org/abs/2401.16887