Structural and optical properties of self-assembled AlN nanowires grown on SiO2/Si substrates by molecular beam epitaxy

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Hauptverfasser: Gačević, Ž., Grandal, J., Guo, Q., Kirste, R., Varela, M., Sitar, Z., García, M. A. Sánchez
Format: Preprint
Veröffentlicht: 2024
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author Gačević, Ž.
Grandal, J.
Guo, Q.
Kirste, R.
Varela, M.
Sitar, Z.
García, M. A. Sánchez
author_facet Gačević, Ž.
Grandal, J.
Guo, Q.
Kirste, R.
Varela, M.
Sitar, Z.
García, M. A. Sánchez
contents Self assembled AlN nanowires (NWs) are grown by plasma assisted molecular beam epitaxy (PAMBE) on SiO2 / Si (111) substrates. Using a combination of in-situ reflective high energy electron diffraction and ex situ X ray diffraction (XRD), we show that the NWs grow nearly strain free, preferentially perpendicular to the amorphous SiO2 interlayer and without epitaxial relationship to Si(111) substrate, as expected. Scanning electron microscopy investigation reveals significant NWs coalescence, which results in their progressively increasing diameter and formation of columnar structures with non hexagonal cross section. Making use of scanning transmission electron microscopy (STEM), the NWs initial diameters are found in the 20 to 30 nm range. In addition, the formation of a thin (30 nm) polycrystalline AlN layer is observed on the substrate surface. Regarding the structural quality of the AlN NWs, STEM measurements reveal the formation of extended columnar regions, which grow with a virtually perfect metal-polarity wurtzite arrangement and with extended defects only sporadically observed. Combination of STEM and electron energy loss spectroscopy (EELS) reveals the formation of continuous aluminum oxide (1 to 2 nm) on the NW surface. Low temperature photoluminescence measurements reveal a single near band edge (NBE) emission peak, positioned at 6.03 eV (at 2 K), a value consistent with nearly zero NW strain evidenced by XRD and in agreement with the values obtained on AlN bulk layers synthesized by other growth techniques. The significant full width at half maximum of NBE emission, found at 20 meV (at 2 K), suggests that free and bound excitons are mixed together within this single emission band.
format Preprint
id arxiv_https___arxiv_org_abs_2402_00216
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Structural and optical properties of self-assembled AlN nanowires grown on SiO2/Si substrates by molecular beam epitaxy
Gačević, Ž.
Grandal, J.
Guo, Q.
Kirste, R.
Varela, M.
Sitar, Z.
García, M. A. Sánchez
Materials Science
Applied Physics
Self assembled AlN nanowires (NWs) are grown by plasma assisted molecular beam epitaxy (PAMBE) on SiO2 / Si (111) substrates. Using a combination of in-situ reflective high energy electron diffraction and ex situ X ray diffraction (XRD), we show that the NWs grow nearly strain free, preferentially perpendicular to the amorphous SiO2 interlayer and without epitaxial relationship to Si(111) substrate, as expected. Scanning electron microscopy investigation reveals significant NWs coalescence, which results in their progressively increasing diameter and formation of columnar structures with non hexagonal cross section. Making use of scanning transmission electron microscopy (STEM), the NWs initial diameters are found in the 20 to 30 nm range. In addition, the formation of a thin (30 nm) polycrystalline AlN layer is observed on the substrate surface. Regarding the structural quality of the AlN NWs, STEM measurements reveal the formation of extended columnar regions, which grow with a virtually perfect metal-polarity wurtzite arrangement and with extended defects only sporadically observed. Combination of STEM and electron energy loss spectroscopy (EELS) reveals the formation of continuous aluminum oxide (1 to 2 nm) on the NW surface. Low temperature photoluminescence measurements reveal a single near band edge (NBE) emission peak, positioned at 6.03 eV (at 2 K), a value consistent with nearly zero NW strain evidenced by XRD and in agreement with the values obtained on AlN bulk layers synthesized by other growth techniques. The significant full width at half maximum of NBE emission, found at 20 meV (at 2 K), suggests that free and bound excitons are mixed together within this single emission band.
title Structural and optical properties of self-assembled AlN nanowires grown on SiO2/Si substrates by molecular beam epitaxy
topic Materials Science
Applied Physics
url https://arxiv.org/abs/2402.00216