Nano-ironing van der Waals Heterostructures Towards Electrically Controlled Quantum Dots
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arXiv
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| Autores principales: | , , , , , , , , , , , , , |
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| Formato: | Preprint |
| Publicado: |
2024
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| _version_ | 1866910316287229952 |
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| author | Talha-Dean, Teymour Tarn, Yaoju Mukherjee, Subhrajit John, John Wellington Huang, Ding Verzhbitskiy, Ivan A. Venkatakrishnarao, Dasari Das, Sarthak Lee, Rainer Mishra, Abhishek Wang, Shuhua Ang, Yee Sin Goh, Kuan Eng Johnson Lau, Chit Siong |
| author_facet | Talha-Dean, Teymour Tarn, Yaoju Mukherjee, Subhrajit John, John Wellington Huang, Ding Verzhbitskiy, Ivan A. Venkatakrishnarao, Dasari Das, Sarthak Lee, Rainer Mishra, Abhishek Wang, Shuhua Ang, Yee Sin Goh, Kuan Eng Johnson Lau, Chit Siong |
| contents | Assembling two-dimensional van der Waals layered materials into heterostructures is an exciting development that sparked the discovery of rich correlated electronic phenomena and offers possibilities for designer device applications. However, resist residue from fabrication processes is a major limitation. Resulting disordered interfaces degrade device performance and mask underlying transport physics. Conventional cleaning processes are inefficient and can cause material and device damage. Here, we show that thermal scanning probe based cleaning can effectively eliminate resist residue to recover pristine material surfaces. Our technique is compatible at both the material- and device-level, and we demonstrate the significant improvement in the electrical performance of 2D WS2 transistors. We also demonstrate the cleaning of van der Waals heterostructures to achieve interfaces with low disorder. This enables the electrical formation and control of quantum dots that can be tuned from macroscopic current flow to the single-electron tunnelling regime. Such material processing advances are crucial for constructing high-quality vdW heterostructures that are important platforms for fundamental studies and building blocks for quantum and nano-electronics applications. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2402_01185 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Nano-ironing van der Waals Heterostructures Towards Electrically Controlled Quantum Dots Talha-Dean, Teymour Tarn, Yaoju Mukherjee, Subhrajit John, John Wellington Huang, Ding Verzhbitskiy, Ivan A. Venkatakrishnarao, Dasari Das, Sarthak Lee, Rainer Mishra, Abhishek Wang, Shuhua Ang, Yee Sin Goh, Kuan Eng Johnson Lau, Chit Siong Mesoscale and Nanoscale Physics Materials Science Assembling two-dimensional van der Waals layered materials into heterostructures is an exciting development that sparked the discovery of rich correlated electronic phenomena and offers possibilities for designer device applications. However, resist residue from fabrication processes is a major limitation. Resulting disordered interfaces degrade device performance and mask underlying transport physics. Conventional cleaning processes are inefficient and can cause material and device damage. Here, we show that thermal scanning probe based cleaning can effectively eliminate resist residue to recover pristine material surfaces. Our technique is compatible at both the material- and device-level, and we demonstrate the significant improvement in the electrical performance of 2D WS2 transistors. We also demonstrate the cleaning of van der Waals heterostructures to achieve interfaces with low disorder. This enables the electrical formation and control of quantum dots that can be tuned from macroscopic current flow to the single-electron tunnelling regime. Such material processing advances are crucial for constructing high-quality vdW heterostructures that are important platforms for fundamental studies and building blocks for quantum and nano-electronics applications. |
| title | Nano-ironing van der Waals Heterostructures Towards Electrically Controlled Quantum Dots |
| topic | Mesoscale and Nanoscale Physics Materials Science |
| url | https://arxiv.org/abs/2402.01185 |