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Designing topology and fractionalization in narrow gap semiconductor films via electrostatic engineering

Fuente: arXiv

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Détails bibliographiques
Auteurs principaux:	Tan, Tixuan, Reddy, Aidan P., Fu, Liang, Devakul, Trithep
Format:	Preprint
Publié:	2024
Sujets:	Strongly Correlated Electrons Mesoscale and Nanoscale Physics
Accès en ligne:	Acceder al recurso
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

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