Geometrically-Controlled Microscale Patterning and Epitaxial Lateral Overgrowth of Nitrogen-Polar GaN
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2024
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| author | Pampili, Pietro Zubialevich, Vitaly Z. Parbrook, Peter J. |
| author_facet | Pampili, Pietro Zubialevich, Vitaly Z. Parbrook, Peter J. |
| contents | In this study we report on a novel two-step epitaxial growth technique that enables a significant improvement of the crystal quality of nitrogen-polar GaN. The starting material is grown on 4° vicinal sapphire substrates by metal organic vapour phase epitaxy, with an initial high-temperature sapphire nitridation to control polarity. The material is then converted into a regular array of hexagonal pyramids by wet-etch in a KOH solution, and subsequently regrown to coalesce the pyramids back into a smooth layer of improved crystal quality. The key points that enable this technique are the control of the array geometry, obtained by exploiting the anisotropic behaviour of the wet-etch step, and the use of regrowth conditions that preserve the orientation of the pyramids' sidewalls. In contrast, growth conditions that cause an excessive expansion of the residual (000-1) facets on the pyramids' tops cause the onset of a very rough surface morphology upon full coalescence. An X-ray diffraction study confirms the reduction of the threading dislocation density as the regrowth step develops. The analysis of the relative position of the 000-2 GaN peak with respect to the 0006 sapphire peak reveals a macroscopic tilt of the pyramids, probably induced by the large off-axis substrate orientation. This tilt correlates very well with an anomalous broadening of the 000-2 diffraction peaks at the beginning of the regrowth step. |
| format | Preprint |
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arxiv_https___arxiv_org_abs_2402_09385 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Geometrically-Controlled Microscale Patterning and Epitaxial Lateral Overgrowth of Nitrogen-Polar GaN Pampili, Pietro Zubialevich, Vitaly Z. Parbrook, Peter J. Materials Science Applied Physics In this study we report on a novel two-step epitaxial growth technique that enables a significant improvement of the crystal quality of nitrogen-polar GaN. The starting material is grown on 4° vicinal sapphire substrates by metal organic vapour phase epitaxy, with an initial high-temperature sapphire nitridation to control polarity. The material is then converted into a regular array of hexagonal pyramids by wet-etch in a KOH solution, and subsequently regrown to coalesce the pyramids back into a smooth layer of improved crystal quality. The key points that enable this technique are the control of the array geometry, obtained by exploiting the anisotropic behaviour of the wet-etch step, and the use of regrowth conditions that preserve the orientation of the pyramids' sidewalls. In contrast, growth conditions that cause an excessive expansion of the residual (000-1) facets on the pyramids' tops cause the onset of a very rough surface morphology upon full coalescence. An X-ray diffraction study confirms the reduction of the threading dislocation density as the regrowth step develops. The analysis of the relative position of the 000-2 GaN peak with respect to the 0006 sapphire peak reveals a macroscopic tilt of the pyramids, probably induced by the large off-axis substrate orientation. This tilt correlates very well with an anomalous broadening of the 000-2 diffraction peaks at the beginning of the regrowth step. |
| title | Geometrically-Controlled Microscale Patterning and Epitaxial Lateral Overgrowth of Nitrogen-Polar GaN |
| topic | Materials Science Applied Physics |
| url | https://arxiv.org/abs/2402.09385 |