Fabrication uncertainty guided design optimization of a photonic crystal cavity by using Gaussian processes

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Hauptverfasser: Plock, Matthias, Binkowski, Felix, Zschiedrich, Lin, Schneider, Philipp-Immanuel, Burger, Sven
Format: Preprint
Veröffentlicht: 2024
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author Plock, Matthias
Binkowski, Felix
Zschiedrich, Lin
Schneider, Philipp-Immanuel
Burger, Sven
author_facet Plock, Matthias
Binkowski, Felix
Zschiedrich, Lin
Schneider, Philipp-Immanuel
Burger, Sven
contents We present a fabrication uncertainty aware and robust design optimization approach that can be used to obtain robust design estimates for nonlinear, nonconvex, and expensive model functions. It is founded on Gaussian processes and a Monte Carlo sampling procedure, and assumes knowledge about the uncertainties associated with a manufacturing process. The approach itself is iterative. First, a large parameter domain is sampled in a coarse fashion. This coarse sampling is used primarily to determine smaller candidate regions to investigate in a second, more refined sampling pass. This finer step is used to obtain an estimate of the expected performance of the found design parameter under the assumed manufacturing uncertainties. We apply the presented approach to the robust optimization of the Purcell enhancement of a photonic crystal nanobeam cavity. We obtain a predicted robust Purcell enhancement of $\overline{F}_{\mathrm{P}} \approx 3.3$. For comparison we also perform an optimization without robustness. We find that an unrobust optimum of $F_{\mathrm{P}} \approx 256.5$ dwindles to only $\overline{F}_{\mathrm{P}} \approx 0.7$ when fabrication uncertainties are taken into account. We thus demonstrate that the presented approach is able to find designs of significantly higher performance than those obtained with conventional optimization.
format Preprint
id arxiv_https___arxiv_org_abs_2402_09420
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Fabrication uncertainty guided design optimization of a photonic crystal cavity by using Gaussian processes
Plock, Matthias
Binkowski, Felix
Zschiedrich, Lin
Schneider, Philipp-Immanuel
Burger, Sven
Signal Processing
Optics
We present a fabrication uncertainty aware and robust design optimization approach that can be used to obtain robust design estimates for nonlinear, nonconvex, and expensive model functions. It is founded on Gaussian processes and a Monte Carlo sampling procedure, and assumes knowledge about the uncertainties associated with a manufacturing process. The approach itself is iterative. First, a large parameter domain is sampled in a coarse fashion. This coarse sampling is used primarily to determine smaller candidate regions to investigate in a second, more refined sampling pass. This finer step is used to obtain an estimate of the expected performance of the found design parameter under the assumed manufacturing uncertainties. We apply the presented approach to the robust optimization of the Purcell enhancement of a photonic crystal nanobeam cavity. We obtain a predicted robust Purcell enhancement of $\overline{F}_{\mathrm{P}} \approx 3.3$. For comparison we also perform an optimization without robustness. We find that an unrobust optimum of $F_{\mathrm{P}} \approx 256.5$ dwindles to only $\overline{F}_{\mathrm{P}} \approx 0.7$ when fabrication uncertainties are taken into account. We thus demonstrate that the presented approach is able to find designs of significantly higher performance than those obtained with conventional optimization.
title Fabrication uncertainty guided design optimization of a photonic crystal cavity by using Gaussian processes
topic Signal Processing
Optics
url https://arxiv.org/abs/2402.09420