X-ray multibeam ptychography at up to 20 keV: nano-lithography enhances X-ray nano-imaging

Fuente: arXiv

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Bibliographic Details
Main Authors:	Li, Tang, Kahnt, Maik, Sheppard, Thomas L., Yang, Runqing, Falch, Ken Vidar, Zvagelsky, Roman, Villanueva-Perez, Pablo, Wegener, Martin, Lyubomirskiy, Mikhail
Format:	Preprint
Published:	2024
Subjects:	Applied Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2402.12082