Universal Metallic Surface States in Electride

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Hauptverfasser: Wang, Dan, Song, Hongxing, Zhang, Leilei, Wang, Hao, Sun, Yi, Wu, Fengchao, Chen, Ying, Chen, Xiangrong, Geng, Hua Y.
Format: Preprint
Veröffentlicht: 2024
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author Wang, Dan
Song, Hongxing
Zhang, Leilei
Wang, Hao
Sun, Yi
Wu, Fengchao
Chen, Ying
Chen, Xiangrong
Geng, Hua Y.
author_facet Wang, Dan
Song, Hongxing
Zhang, Leilei
Wang, Hao
Sun, Yi
Wu, Fengchao
Chen, Ying
Chen, Xiangrong
Geng, Hua Y.
contents Robust metallic surface states (MSS) of topological insulator (TI) against imperfections and perturbations are important in broad applications such as chemical catalysis and quantum computing. Unfortunately, they are suffered from the narrow band gap that can be accessed. Searching for MSS with large bulk band gap beyond conventional TIs becomes a quest. In this work, inspired by the adiabatic connection principle in real space, we identify that all electrides, a new class of emerging materials, must host robust and universal MSS that resists any disturbances, in spite of the fact that some of them could be classified as trivial in standard topology theory. This counterintuitive property is traced to the specific charge localization-delocalization change intrinsic to electride when approaching the crystalline surface or interface, which is a kind of interstice-centered to atom-centered transition in the real-space topology of the charge density distribution, and is sharply different from the band inversion in the standard topology theory. The new mechanism circumvents the obstacle that limits the band gap of TI. Robust and universal MSS in an electride that conventionally-determined as trivial but with a colossal band gap beyond 6.13 eV are demonstrated. This gap size is about 6-fold larger than the highest record of known "wide-gap" TIs, thus opens up new avenues to universal MSS with gigantic bulk gap.
format Preprint
id arxiv_https___arxiv_org_abs_2402_15798
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Universal Metallic Surface States in Electride
Wang, Dan
Song, Hongxing
Zhang, Leilei
Wang, Hao
Sun, Yi
Wu, Fengchao
Chen, Ying
Chen, Xiangrong
Geng, Hua Y.
Materials Science
Applied Physics
Chemical Physics
Computational Physics
Quantum Physics
Robust metallic surface states (MSS) of topological insulator (TI) against imperfections and perturbations are important in broad applications such as chemical catalysis and quantum computing. Unfortunately, they are suffered from the narrow band gap that can be accessed. Searching for MSS with large bulk band gap beyond conventional TIs becomes a quest. In this work, inspired by the adiabatic connection principle in real space, we identify that all electrides, a new class of emerging materials, must host robust and universal MSS that resists any disturbances, in spite of the fact that some of them could be classified as trivial in standard topology theory. This counterintuitive property is traced to the specific charge localization-delocalization change intrinsic to electride when approaching the crystalline surface or interface, which is a kind of interstice-centered to atom-centered transition in the real-space topology of the charge density distribution, and is sharply different from the band inversion in the standard topology theory. The new mechanism circumvents the obstacle that limits the band gap of TI. Robust and universal MSS in an electride that conventionally-determined as trivial but with a colossal band gap beyond 6.13 eV are demonstrated. This gap size is about 6-fold larger than the highest record of known "wide-gap" TIs, thus opens up new avenues to universal MSS with gigantic bulk gap.
title Universal Metallic Surface States in Electride
topic Materials Science
Applied Physics
Chemical Physics
Computational Physics
Quantum Physics
url https://arxiv.org/abs/2402.15798