Characterization of process-related interfacial dielectric loss in aluminum-on-silicon by resonator microwave measurements, materials analysis, and imaging

Fuente: arXiv

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Bibliographic Details
Main Authors:	Chayanun, Lert, Biznárová, Janka, Zeng, Lunjie, Malmberg, Per, Nylander, Andreas, Osman, Amr, Rommel, Marcus, Tam, Pui Lam, Olsson, Eva, Yurgens, August, Bylander, Jonas, Roudsari, Anita Fadavi
Format:	Preprint
Published:	2024
Subjects:	Quantum Physics Superconductivity
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2403.00723