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Characterization of process-related interfacial dielectric loss in aluminum-on-silicon by resonator microwave measurements, materials analysis, and imaging

Fuente: arXiv

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Detalles Bibliográficos
Autores principales:	Chayanun, Lert, Biznárová, Janka, Zeng, Lunjie, Malmberg, Per, Nylander, Andreas, Osman, Amr, Rommel, Marcus, Tam, Pui Lam, Olsson, Eva, Yurgens, August, Bylander, Jonas, Roudsari, Anita Fadavi
Formato:	Preprint
Publicado:	2024
Materias:	Quantum Physics Superconductivity
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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