Strain-induced valley transport in CrBr$_3$/WSe$_2$/CrBr$_3$ van der Waals heterostructure

Fuente: arXiv
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Auteurs principaux: Soriano, David, Marian, Damiano, Dubey, Prabhat, Fiori, Gianluca
Format: Preprint
Publié: 2024
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author Soriano, David
Marian, Damiano
Dubey, Prabhat
Fiori, Gianluca
author_facet Soriano, David
Marian, Damiano
Dubey, Prabhat
Fiori, Gianluca
contents Two dimensional magnetic materials are at the forefront of the next generation of spintronic devices. The possibility to interface them with other van der Waals materials such as transition metal dichalcogenides has opened new possibilities for the observation of new and exiting physical phenomena. Here, we present a proof-of-concept valleytronic device based on CrBr$_3$-encapsulated WSe$_2$ showing an unprecedented valley splitting of $\sim 100$ meV under compressive strain of the WSe$_2$, able to be tuned by the relative magnetization of the encapsulating layers. Multiscale transport simulations performed on this device show a spin-valley current with a polarization higher than 80$\%$ than is maintained in a range of $\sim$ 0.3 V gate voltage in a field-effect transistor configuration. The impact of the stacking configuration on the valley splitting is also evaluated.
format Preprint
id arxiv_https___arxiv_org_abs_2403_02188
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Strain-induced valley transport in CrBr$_3$/WSe$_2$/CrBr$_3$ van der Waals heterostructure
Soriano, David
Marian, Damiano
Dubey, Prabhat
Fiori, Gianluca
Mesoscale and Nanoscale Physics
Materials Science
Strongly Correlated Electrons
Two dimensional magnetic materials are at the forefront of the next generation of spintronic devices. The possibility to interface them with other van der Waals materials such as transition metal dichalcogenides has opened new possibilities for the observation of new and exiting physical phenomena. Here, we present a proof-of-concept valleytronic device based on CrBr$_3$-encapsulated WSe$_2$ showing an unprecedented valley splitting of $\sim 100$ meV under compressive strain of the WSe$_2$, able to be tuned by the relative magnetization of the encapsulating layers. Multiscale transport simulations performed on this device show a spin-valley current with a polarization higher than 80$\%$ than is maintained in a range of $\sim$ 0.3 V gate voltage in a field-effect transistor configuration. The impact of the stacking configuration on the valley splitting is also evaluated.
title Strain-induced valley transport in CrBr$_3$/WSe$_2$/CrBr$_3$ van der Waals heterostructure
topic Mesoscale and Nanoscale Physics
Materials Science
Strongly Correlated Electrons
url https://arxiv.org/abs/2403.02188