APA (7th ed.) Citation

Peng, B., Qu, S., Wu, Y., Zou, T., He, L., Knoll, A., . . . jiang, c. (2024). MAP: MAsk-Pruning for Source-Free Model Intellectual Property Protection.

Chicago Style (17th ed.) Citation

Peng, Boyang, Sanqing Qu, Yong Wu, Tianpei Zou, Lianghua He, Alois Knoll, Guang Chen, and changjun jiang. MAP: MAsk-Pruning for Source-Free Model Intellectual Property Protection. 2024.

MLA (9th ed.) Citation

Peng, Boyang, et al. MAP: MAsk-Pruning for Source-Free Model Intellectual Property Protection. 2024.