Generation and high-resolution imaging of higher-order polarization via metasurface
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arXiv
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| Autori principali: | , , , |
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| Natura: | Preprint |
| Pubblicazione: |
2024
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| _version_ | 1866910463707578368 |
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| author | Yuan, Xiang Guo, Hanming Zhuang, Songlin Hu, Jinbing |
| author_facet | Yuan, Xiang Guo, Hanming Zhuang, Songlin Hu, Jinbing |
| contents | The generation and focusing properties of higher-order polarized beams have attracted lots of interests due to its significant applications. In this paper,we derived the formula of transforming linear polarization into higher-order polarization, which is applicable to generating arbitrary order polarization. Based on the derived formula, the focusing properties of higher-order polarization by dielectric metasurface lens are studied , which exhibit an Abbe-limit-breaking feature for small numerical aperture, i.e., NA<0.6. When a binary phase (0 & π) is further imposed on the aperture of metasurface lens, the focusing spot of fourth-order polarization breaks Abbe limit even by 14.3% at NA= 0.6. In addition, the effect of fabrication tolerance, say, substrate thickness and central deviation, on the focusing feature of higher-order polarization is also investigated. Our study may find significant applications in achieving higher-resolution lithography and imaging, say, by just replacing conventional linear or circular polarization with higher-order polarization. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2403_08539 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Generation and high-resolution imaging of higher-order polarization via metasurface Yuan, Xiang Guo, Hanming Zhuang, Songlin Hu, Jinbing Optics The generation and focusing properties of higher-order polarized beams have attracted lots of interests due to its significant applications. In this paper,we derived the formula of transforming linear polarization into higher-order polarization, which is applicable to generating arbitrary order polarization. Based on the derived formula, the focusing properties of higher-order polarization by dielectric metasurface lens are studied , which exhibit an Abbe-limit-breaking feature for small numerical aperture, i.e., NA<0.6. When a binary phase (0 & π) is further imposed on the aperture of metasurface lens, the focusing spot of fourth-order polarization breaks Abbe limit even by 14.3% at NA= 0.6. In addition, the effect of fabrication tolerance, say, substrate thickness and central deviation, on the focusing feature of higher-order polarization is also investigated. Our study may find significant applications in achieving higher-resolution lithography and imaging, say, by just replacing conventional linear or circular polarization with higher-order polarization. |
| title | Generation and high-resolution imaging of higher-order polarization via metasurface |
| topic | Optics |
| url | https://arxiv.org/abs/2403.08539 |