Intervalence Plasmons in Boron-Doped Diamond

Fuente: arXiv
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Autori principali: Bhattacharya, Souvik, Boyd, Jonathan, Reichardt, Sven, Allard, Valentin, Talebi, Amir Hossein, Maccaferri, Nicolò, Shenderova, Olga, Lereu, Aude L., Wirtz, Ludger, Strangi, Giuseppe, Sankaran, R. Mohan
Natura: Preprint
Pubblicazione: 2024
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author Bhattacharya, Souvik
Boyd, Jonathan
Reichardt, Sven
Allard, Valentin
Talebi, Amir Hossein
Maccaferri, Nicolò
Shenderova, Olga
Lereu, Aude L.
Wirtz, Ludger
Strangi, Giuseppe
Sankaran, R. Mohan
author_facet Bhattacharya, Souvik
Boyd, Jonathan
Reichardt, Sven
Allard, Valentin
Talebi, Amir Hossein
Maccaferri, Nicolò
Shenderova, Olga
Lereu, Aude L.
Wirtz, Ludger
Strangi, Giuseppe
Sankaran, R. Mohan
contents Doped semiconductors can exhibit metallic-like properties ranging from superconductivity to tunable localized surface plasmon resonances. Diamond is a wide-bandgap semiconductor that is rendered electronically active by incorporating a hole dopant, boron. While the effects of boron doping on the electronic band structure of diamond are well-studied, any link between charge carriers and plasmons, has never been shown. Here, we report intervalence plasmons in boron-doped diamond, defined as collective electronic excitations between the valence subbands, opened up by the presence of holes. Evidence for these low-energy excitations is provided by valence electron energy loss spectroscopy and near-field infrared spectroscopy. The measured spectra are subsequently reproduced by first-principles calculations based on the contribution of intervalence band transitions to the dielectric function. Our calculations also reveal that the real part of the dielectric function exhibits a crossover characteristic of metallicity. These results suggest a new mechanism for inducing plasmon-like behavior in doped semiconductors, and the possibility of attaining such properties in diamond, a key emerging material for quantum information technologies.
format Preprint
id arxiv_https___arxiv_org_abs_2403_12221
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Intervalence Plasmons in Boron-Doped Diamond
Bhattacharya, Souvik
Boyd, Jonathan
Reichardt, Sven
Allard, Valentin
Talebi, Amir Hossein
Maccaferri, Nicolò
Shenderova, Olga
Lereu, Aude L.
Wirtz, Ludger
Strangi, Giuseppe
Sankaran, R. Mohan
Materials Science
Optics
Doped semiconductors can exhibit metallic-like properties ranging from superconductivity to tunable localized surface plasmon resonances. Diamond is a wide-bandgap semiconductor that is rendered electronically active by incorporating a hole dopant, boron. While the effects of boron doping on the electronic band structure of diamond are well-studied, any link between charge carriers and plasmons, has never been shown. Here, we report intervalence plasmons in boron-doped diamond, defined as collective electronic excitations between the valence subbands, opened up by the presence of holes. Evidence for these low-energy excitations is provided by valence electron energy loss spectroscopy and near-field infrared spectroscopy. The measured spectra are subsequently reproduced by first-principles calculations based on the contribution of intervalence band transitions to the dielectric function. Our calculations also reveal that the real part of the dielectric function exhibits a crossover characteristic of metallicity. These results suggest a new mechanism for inducing plasmon-like behavior in doped semiconductors, and the possibility of attaining such properties in diamond, a key emerging material for quantum information technologies.
title Intervalence Plasmons in Boron-Doped Diamond
topic Materials Science
Optics
url https://arxiv.org/abs/2403.12221