Effects of dislocation filtering layers on optical properties of third telecom window emitting InAs/InGaAlAs quantum dots grown on silicon substrates

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Hauptverfasser: Rudno-Rudziński, Wojciech, Gawełczyk, Michał, Podemski, Paweł, Balasubramanian, Ramasubramanian, Sichkovskyi, Vitalii, Willinger, Amnon J., Eisenstein, Gadi, Reithmaier, Johann P., Sęk, Grzegorz
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Veröffentlicht: 2024
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author Rudno-Rudziński, Wojciech
Gawełczyk, Michał
Podemski, Paweł
Balasubramanian, Ramasubramanian
Sichkovskyi, Vitalii
Willinger, Amnon J.
Eisenstein, Gadi
Reithmaier, Johann P.
Sęk, Grzegorz
author_facet Rudno-Rudziński, Wojciech
Gawełczyk, Michał
Podemski, Paweł
Balasubramanian, Ramasubramanian
Sichkovskyi, Vitalii
Willinger, Amnon J.
Eisenstein, Gadi
Reithmaier, Johann P.
Sęk, Grzegorz
contents Integrating light emitters based on III-V materials with silicon-based electronics is crucial for further increase in data transfer rates in communication systems since the indirect bandgap of silicon prevents its direct use as a light source. We investigate here InAs/InGaAlAs quantum dot (QD) structures grown directly on 5° off-cut Si substrate and emitting light at 1.5 micrometers, compatible with established telecom platform. Using different dislocation defects filtering layers, exploiting strained superlattices and supplementary QD layers, we mitigate the effects of lattice constant and thermal expansion mismatches between III-V materials and Si during growth. Complementary optical spectroscopy techniques, i.e. photoreflectance and temperature-, time- and polarization- resolved photoluminescence, allow us to determine the optical quality and application potential of the obtained structures by comparing them to a reference sample -- state-of-the-art QDs grown on InP. Experimental findings are supported by calculations of excitonic states and optical transitions by combining multiband k.p and configuration-interaction methods. We show that our design of structures prevents the generation of a considerable density of defects, as intended. The emission of Si-based structures appears to be much broader than for the reference dots, due to the creation of different QD populations which might be a disadvantage in particular laser applications, however, could be favourable for others, e.g. in broadly tunable devices, sensors, or optical amplifiers. Eventually, we identify the overall most promising combination of defect filtering layers, discuss its advantages and limitations, and prospects for further improvements.
format Preprint
id arxiv_https___arxiv_org_abs_2403_13504
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Effects of dislocation filtering layers on optical properties of third telecom window emitting InAs/InGaAlAs quantum dots grown on silicon substrates
Rudno-Rudziński, Wojciech
Gawełczyk, Michał
Podemski, Paweł
Balasubramanian, Ramasubramanian
Sichkovskyi, Vitalii
Willinger, Amnon J.
Eisenstein, Gadi
Reithmaier, Johann P.
Sęk, Grzegorz
Mesoscale and Nanoscale Physics
Materials Science
Applied Physics
Integrating light emitters based on III-V materials with silicon-based electronics is crucial for further increase in data transfer rates in communication systems since the indirect bandgap of silicon prevents its direct use as a light source. We investigate here InAs/InGaAlAs quantum dot (QD) structures grown directly on 5° off-cut Si substrate and emitting light at 1.5 micrometers, compatible with established telecom platform. Using different dislocation defects filtering layers, exploiting strained superlattices and supplementary QD layers, we mitigate the effects of lattice constant and thermal expansion mismatches between III-V materials and Si during growth. Complementary optical spectroscopy techniques, i.e. photoreflectance and temperature-, time- and polarization- resolved photoluminescence, allow us to determine the optical quality and application potential of the obtained structures by comparing them to a reference sample -- state-of-the-art QDs grown on InP. Experimental findings are supported by calculations of excitonic states and optical transitions by combining multiband k.p and configuration-interaction methods. We show that our design of structures prevents the generation of a considerable density of defects, as intended. The emission of Si-based structures appears to be much broader than for the reference dots, due to the creation of different QD populations which might be a disadvantage in particular laser applications, however, could be favourable for others, e.g. in broadly tunable devices, sensors, or optical amplifiers. Eventually, we identify the overall most promising combination of defect filtering layers, discuss its advantages and limitations, and prospects for further improvements.
title Effects of dislocation filtering layers on optical properties of third telecom window emitting InAs/InGaAlAs quantum dots grown on silicon substrates
topic Mesoscale and Nanoscale Physics
Materials Science
Applied Physics
url https://arxiv.org/abs/2403.13504