Surface figure correction using differential deposition of WSi$_2$
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arXiv
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| Main Authors: | , , , , |
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| Format: | Preprint |
| Published: |
2024
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| _version_ | 1866909153119698944 |
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| author | Morawe, Ch. Bras, P. Labouré, S. Perrin, F. Vivo, A. |
| author_facet | Morawe, Ch. Bras, P. Labouré, S. Perrin, F. Vivo, A. |
| contents | The surface figure of an x-ray mirror was improved by differential deposition of WSi$_2$ layers. DC magnetron sputtering through beam-defining apertures was applied on moving substrates to generate thin films with arbitrary longitudinal thickness variations. The required velocity profiles were calculated using a deconvolution algorithm. Height errors were evaluated after each correction iteration using offline visible light surface metrology. WSi$_2$ was selected as a promising material since it conserves the initial substrate surface roughness and limits the film stress to acceptable levels. On a 300 mm long flat Si mirror the shape error was reduced to less than 0.2 nm RMS. |
| format | Preprint |
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arxiv_https___arxiv_org_abs_2403_17498 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Surface figure correction using differential deposition of WSi$_2$ Morawe, Ch. Bras, P. Labouré, S. Perrin, F. Vivo, A. Applied Physics Instrumentation and Detectors Optics The surface figure of an x-ray mirror was improved by differential deposition of WSi$_2$ layers. DC magnetron sputtering through beam-defining apertures was applied on moving substrates to generate thin films with arbitrary longitudinal thickness variations. The required velocity profiles were calculated using a deconvolution algorithm. Height errors were evaluated after each correction iteration using offline visible light surface metrology. WSi$_2$ was selected as a promising material since it conserves the initial substrate surface roughness and limits the film stress to acceptable levels. On a 300 mm long flat Si mirror the shape error was reduced to less than 0.2 nm RMS. |
| title | Surface figure correction using differential deposition of WSi$_2$ |
| topic | Applied Physics Instrumentation and Detectors Optics |
| url | https://arxiv.org/abs/2403.17498 |