APA (7th ed.) Citation

Rebello, A. M., Ruela, L. M., Moreto, G., Klein, N. Y., Martins, E., Oliveira, I. S., . . . Sinnecker, J. P. (2024). Optimizing Josephson Junction Reproducibility in 30 kV E-beam Lithography: Analysis of Backscattered Electron Distribution.

Chicago Style (17th ed.) Citation

Rebello, A. M., L. M. Ruela, G. Moreto, N. Y. Klein, E. Martins, I. S. Oliveira, F. Rouxinol, and J. P. Sinnecker. Optimizing Josephson Junction Reproducibility in 30 KV E-beam Lithography: Analysis of Backscattered Electron Distribution. 2024.

MLA (9th ed.) Citation

Rebello, A. M., et al. Optimizing Josephson Junction Reproducibility in 30 KV E-beam Lithography: Analysis of Backscattered Electron Distribution. 2024.