Optimizing Josephson Junction Reproducibility in 30 kV E-beam Lithography: Analysis of Backscattered Electron Distribution

Fuente: arXiv

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Bibliographic Details
Main Authors:	Rebello, A. M., Ruela, L. M., Moreto, G., Klein, N. Y., Martins, E., Oliveira, I. S., Rouxinol, F., Sinnecker, J. P.
Format:	Preprint
Published:	2024
Subjects:	Quantum Physics Materials Science Superconductivity
Online Access:	Acceder al recurso
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