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Non-Destructive, High-Resolution, Chemically Specific, 3D Nanostructure Characterization using Phase-Sensitive EUV Imaging Reflectometry

Fuente: arXiv

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Bibliographic Details
Main Authors:	Tanksalvala, Michael, Porter, Christina L., Esashi, Yuka, Wang, Bin, Jenkins, Nicholas W., Zhang, Zhe, Miley, Galen P., Knobloch, Joshua L., McBennett, Brendan, Horiguchi, Naoto, Yazdi, Sadegh, Zhou, Jihan, Jacobs, Matthew N., Bevis, Charles S., Karl Jr., Robert M., Johnsen, Peter, Ren, David, Waller, Laura, Adams, Daniel E., Cousin, Seth L., Liao, Chen-Ting, Miao, Jianwei, Gerrity, Michael, Kapteyn, Henry C., Murnane, Margaret M.
Format:	Preprint
Published:	2024
Subjects:	Optics Applied Physics Instrumentation and Detectors
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2404.02170