Non-Destructive, High-Resolution, Chemically Specific, 3D Nanostructure Characterization using Phase-Sensitive EUV Imaging Reflectometry
Fuente:
arXiv
Guardado en:
| Autores principales: | , , , , , , , , , , , , , , , , , , , , , , , , |
|---|---|
| Formato: | Preprint |
| Publicado: |
2024
|
| Materias: | |
| Acceso en línea: | |
| Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
| _version_ | 1866910396483371008 |
|---|---|
| author | Tanksalvala, Michael Porter, Christina L. Esashi, Yuka Wang, Bin Jenkins, Nicholas W. Zhang, Zhe Miley, Galen P. Knobloch, Joshua L. McBennett, Brendan Horiguchi, Naoto Yazdi, Sadegh Zhou, Jihan Jacobs, Matthew N. Bevis, Charles S. Karl Jr., Robert M. Johnsen, Peter Ren, David Waller, Laura Adams, Daniel E. Cousin, Seth L. Liao, Chen-Ting Miao, Jianwei Gerrity, Michael Kapteyn, Henry C. Murnane, Margaret M. |
| author_facet | Tanksalvala, Michael Porter, Christina L. Esashi, Yuka Wang, Bin Jenkins, Nicholas W. Zhang, Zhe Miley, Galen P. Knobloch, Joshua L. McBennett, Brendan Horiguchi, Naoto Yazdi, Sadegh Zhou, Jihan Jacobs, Matthew N. Bevis, Charles S. Karl Jr., Robert M. Johnsen, Peter Ren, David Waller, Laura Adams, Daniel E. Cousin, Seth L. Liao, Chen-Ting Miao, Jianwei Gerrity, Michael Kapteyn, Henry C. Murnane, Margaret M. |
| contents | Next-generation nano and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink to the nanoscale, their performance is often governed by interface quality or precise chemical or dopant composition. Here we present the first phase-sensitive extreme ultraviolet imaging reflectometer. It combines the excellent phase stability of coherent high-harmonic sources, the unique chemical- and phase-sensitivity of extreme ultraviolet reflectometry, and state-of-the-art ptychography imaging algorithms. This tabletop microscope can non-destructively probe surface topography, layer thicknesses, and interface quality, as well as dopant concentrations and profiles. High-fidelity imaging was achieved by implementing variable-angle ptychographic imaging, by using total variation regularization to mitigate noise and artifacts in the reconstructed image, and by using a high-brightness, high-harmonic source with excellent intensity and wavefront stability. We validate our measurements through multiscale, multimodal imaging to show that this technique has unique advantages compared with other techniques based on electron and scanning-probe microscopies. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2404_02170 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Non-Destructive, High-Resolution, Chemically Specific, 3D Nanostructure Characterization using Phase-Sensitive EUV Imaging Reflectometry Tanksalvala, Michael Porter, Christina L. Esashi, Yuka Wang, Bin Jenkins, Nicholas W. Zhang, Zhe Miley, Galen P. Knobloch, Joshua L. McBennett, Brendan Horiguchi, Naoto Yazdi, Sadegh Zhou, Jihan Jacobs, Matthew N. Bevis, Charles S. Karl Jr., Robert M. Johnsen, Peter Ren, David Waller, Laura Adams, Daniel E. Cousin, Seth L. Liao, Chen-Ting Miao, Jianwei Gerrity, Michael Kapteyn, Henry C. Murnane, Margaret M. Optics Applied Physics Instrumentation and Detectors Next-generation nano and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink to the nanoscale, their performance is often governed by interface quality or precise chemical or dopant composition. Here we present the first phase-sensitive extreme ultraviolet imaging reflectometer. It combines the excellent phase stability of coherent high-harmonic sources, the unique chemical- and phase-sensitivity of extreme ultraviolet reflectometry, and state-of-the-art ptychography imaging algorithms. This tabletop microscope can non-destructively probe surface topography, layer thicknesses, and interface quality, as well as dopant concentrations and profiles. High-fidelity imaging was achieved by implementing variable-angle ptychographic imaging, by using total variation regularization to mitigate noise and artifacts in the reconstructed image, and by using a high-brightness, high-harmonic source with excellent intensity and wavefront stability. We validate our measurements through multiscale, multimodal imaging to show that this technique has unique advantages compared with other techniques based on electron and scanning-probe microscopies. |
| title | Non-Destructive, High-Resolution, Chemically Specific, 3D Nanostructure Characterization using Phase-Sensitive EUV Imaging Reflectometry |
| topic | Optics Applied Physics Instrumentation and Detectors |
| url | https://arxiv.org/abs/2404.02170 |