LayoutLLM: Layout Instruction Tuning with Large Language Models for Document Understanding

Fuente: arXiv

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Bibliographic Details
Main Authors:	Luo, Chuwei, Shen, Yufan, Zhu, Zhaoqing, Zheng, Qi, Yu, Zhi, Yao, Cong
Format:	Preprint
Published:	2024
Subjects:	Computer Vision and Pattern Recognition Computation and Language
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2404.05225